Engineering & Materials Science
Oxides
Hot carriers
Polysilicon
Dynamic random access storage
Boron
Nitrogen
Ion implantation
Transistors
Electric potential
Static random access storage
Leakage currents
Silicon
Oxide films
Data storage equipment
MOSFET devices
Oxide semiconductors
Threshold voltage
Degradation
Electrodes
Substrates
Nitridation
Epitaxial layers
Metals
Interface states
Chemical vapor deposition
Capacitance
Electric fields
Hot electrons
Flash memory
Networks (circuits)
Deep level transient spectroscopy
Oxidation
Atoms
Induced currents
Drain current
Analog circuits
Alpha particles
Ion beams
Rapid thermal annealing
Focused ion beams
Vapors
Field effect transistors
Scalability
Heavy metals
Thin film transistors
Defects
Doping (additives)
Masks
Charge carriers
Silicon on insulator technology
Physics & Astronomy
CMOS
field effect transistors
implantation
isolation
oxides
SOI (semiconductors)
low voltage
nitrogen
transistors
leakage
metal oxide semiconductors
performance
random access memory
degradation
silicon
boron
cells
oxide films
spacers
large scale integration
logic
insulators
retarding
traps
proximity
floating
electrodes
ion implantation
analogs
capacitance
carrier injection
electric potential
penetration
capacitors
engineering
birds
flash
oxidation
vapor deposition
immunity
scaling
electrical resistivity
layouts
micrometers
diodes
vapors
systems-on-a-chip
masks
high speed
alpha particles
Chemical Compounds
Oxides
Polysilicon
Static random access storage
Epitaxial layers
Hot carriers
Silicon
Deep level transient spectroscopy
Transistors
Oxide semiconductors
Substrates
Vapors
indium phosphide
Leakage currents
Metals
Semiconductor diodes
Boron
Charge carriers
Interface states
Silicon on insulator technology
Electrodes
Analog circuits
Focused ion beams
Electric fields
Data storage equipment
Ions
Dynamic random access storage
Capacitance
Thin film transistors
Oxide films
MOSFET devices
Chemical vapor deposition
