Nobuya Hiroshiba

講師(任期付)

  • 352 Citations
  • 10 h-Index
20042018
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Field effect transistors Chemical Compounds
field effect transistors Physics & Astronomy
thin films Physics & Astronomy
Resins Engineering & Materials Science
Thin films Engineering & Materials Science
Substrates Engineering & Materials Science
Organic field effect transistors Engineering & Materials Science
Nanoimprint lithography Engineering & Materials Science

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Research Output 2004 2018

  • 352 Citations
  • 10 h-Index
  • 35 Article
  • 4 Conference contribution
  • 1 Review article
2 Citations (Scopus)

Elemental depth profiles and plasma etching rates of positive-tone electron beam resists after sequential infiltration synthesis of alumina

Ozaki, Y., Ito, S., Hiroshiba, N., Nakamura, T. & Nakagawa, M., 2018 Jun 1, In : Japanese Journal of Applied Physics. 57, 6, 06HG01.

Research output: Contribution to journalArticle

Plasma etching
plasma etching
infiltration
Infiltration
Electron beams
2 Citations (Scopus)

Crystallographic polarity effect of ZnO on thin film growth of pentacene

Nakamura, T., Nagata, T., Hayakawa, R., Yoshimura, T., Oh, S., Hiroshiba, N., Chikyow, T., Fujimura, N. & Wakayama, Y., 2017 Apr 1, In : Japanese Journal of Applied Physics. 56, 4, 04CJ03.

Research output: Contribution to journalArticle

Film growth
polarity
Thin films
Substrates
thin films

Photoelectron spectroscopic study on monolayer pentacene thin-film/polar ZnO single-crystal hybrid interface

Nagata, T., Nakamura, T., Hayakawa, R., Yoshimura, T., Oh, S., Hiroshiba, N., Chikyow, T., Fujimura, N. & Wakayama, Y., 2017 Feb 1, In : Applied Physics Express. 10, 2, 025702.

Research output: Contribution to journalArticle

Electronic states
Photoelectrons
Monolayers
polarity
photoelectrons
5 Citations (Scopus)

Anisotropic oxygen reactive ion etching for removing residual layers from 45 nm-width imprint patterns

Uehara, T., Kubo, S., Hiroshiba, N. & Nakagawa, M., 2016 Jan 1, In : Journal of Photopolymer Science and Technology. 29, 2, p. 201-208 8 p.

Research output: Contribution to journalArticle

Reactive ion etching
Silicon
Dry etching
Oxygen
Linewidth
1 Citation (Scopus)

Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

Ishito, Y., Yano, H., Hiroshiba, N., Kubo, S. & Nakagawa, M., 2016 Jan 1, In : Chemistry Letters. 45, 12, p. 1373-1375 3 p.

Research output: Contribution to journalArticle

Resins
Fluorescence microscopy
Throughput
Photopolymerization
Differential scanning calorimetry