A challenge of new materials for next generation's magnetic recording

Tetsuya Osaka, Junichi Sayama

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Our recent study on a challenge of new materials for next generation's magnetic recording approaching an ultra high areal recording density beyond 1 Tbit/in.2 is overviewed. We proposed novel methods for fabricating high performance magnetic recording heads and media by making the best use of wet (electro- and electroless-deposition) and dry (sputtering) processes. We believe that these results contribute significantly to the progress in magnetic recording and constitute a breakthrough for materializing an unexplored areal recording density beyond 1 Tbit/in.2.

Original languageEnglish
Pages (from-to)2884-2890
Number of pages7
JournalElectrochimica Acta
Volume52
Issue number8 SPEC. ISS.
DOIs
Publication statusPublished - 2007 Feb 10

Fingerprint

Magnetic recording
Electroless plating
Electrodeposition
Sputtering

Keywords

  • Electro-deposition
  • Electroless-deposition
  • Magnetic recording
  • Sputtering
  • Thin film

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Analytical Chemistry
  • Electrochemistry

Cite this

A challenge of new materials for next generation's magnetic recording. / Osaka, Tetsuya; Sayama, Junichi.

In: Electrochimica Acta, Vol. 52, No. 8 SPEC. ISS., 10.02.2007, p. 2884-2890.

Research output: Contribution to journalArticle

Osaka, Tetsuya ; Sayama, Junichi. / A challenge of new materials for next generation's magnetic recording. In: Electrochimica Acta. 2007 ; Vol. 52, No. 8 SPEC. ISS. pp. 2884-2890.
@article{a51c79e4540e47daa097bb68d116ccb1,
title = "A challenge of new materials for next generation's magnetic recording",
abstract = "Our recent study on a challenge of new materials for next generation's magnetic recording approaching an ultra high areal recording density beyond 1 Tbit/in.2 is overviewed. We proposed novel methods for fabricating high performance magnetic recording heads and media by making the best use of wet (electro- and electroless-deposition) and dry (sputtering) processes. We believe that these results contribute significantly to the progress in magnetic recording and constitute a breakthrough for materializing an unexplored areal recording density beyond 1 Tbit/in.2.",
keywords = "Electro-deposition, Electroless-deposition, Magnetic recording, Sputtering, Thin film",
author = "Tetsuya Osaka and Junichi Sayama",
year = "2007",
month = "2",
day = "10",
doi = "10.1016/j.electacta.2006.09.005",
language = "English",
volume = "52",
pages = "2884--2890",
journal = "Electrochimica Acta",
issn = "0013-4686",
publisher = "Elsevier Limited",
number = "8 SPEC. ISS.",

}

TY - JOUR

T1 - A challenge of new materials for next generation's magnetic recording

AU - Osaka, Tetsuya

AU - Sayama, Junichi

PY - 2007/2/10

Y1 - 2007/2/10

N2 - Our recent study on a challenge of new materials for next generation's magnetic recording approaching an ultra high areal recording density beyond 1 Tbit/in.2 is overviewed. We proposed novel methods for fabricating high performance magnetic recording heads and media by making the best use of wet (electro- and electroless-deposition) and dry (sputtering) processes. We believe that these results contribute significantly to the progress in magnetic recording and constitute a breakthrough for materializing an unexplored areal recording density beyond 1 Tbit/in.2.

AB - Our recent study on a challenge of new materials for next generation's magnetic recording approaching an ultra high areal recording density beyond 1 Tbit/in.2 is overviewed. We proposed novel methods for fabricating high performance magnetic recording heads and media by making the best use of wet (electro- and electroless-deposition) and dry (sputtering) processes. We believe that these results contribute significantly to the progress in magnetic recording and constitute a breakthrough for materializing an unexplored areal recording density beyond 1 Tbit/in.2.

KW - Electro-deposition

KW - Electroless-deposition

KW - Magnetic recording

KW - Sputtering

KW - Thin film

UR - http://www.scopus.com/inward/record.url?scp=33846551189&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33846551189&partnerID=8YFLogxK

U2 - 10.1016/j.electacta.2006.09.005

DO - 10.1016/j.electacta.2006.09.005

M3 - Article

VL - 52

SP - 2884

EP - 2890

JO - Electrochimica Acta

JF - Electrochimica Acta

SN - 0013-4686

IS - 8 SPEC. ISS.

ER -