A combined top-down and bottom-up approach to fabricate silica films with bimodal porosity

Kazuya Ijichi, Ayumu Fukuoka, Atsushi Shimojima, Masakazu Sugiyama, Tatsuya Okubo

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

We report a method to fabricate silica films with bimodal porosity based on the surfactant-directed self-assembly process followed by post-treatment with reactive ion etching (RIE). By RIE of a surfactant-templated mesoporous silica film with a 3D hexagonal structure, vertically-etched pores with the size of several tens of nanometers and the depth of ca. 60 nm are generated, while the original caged mesopores (ca. 5 nm in size) are still retained in the unetched parts of the film. Pre-treatment of the mesoporous silica film by wet-etching to expose the pores on the surface, followed by sputter deposition of a Pt layer for partial masking, is crucial for the anisotropic etching of the film. Such a combined top-down and bottom up approach offers an opportunity to fabricate silica films with hierarchical pore architectures.

Original languageEnglish
Pages (from-to)828-831
Number of pages4
JournalMaterials Letters
Volume65
Issue number5
DOIs
Publication statusPublished - 2011 Mar 15
Externally publishedYes

Fingerprint

Silicon Dioxide
Porosity
Silica
silicon dioxide
porosity
etching
Reactive ion etching
Surface-Active Agents
Surface active agents
surfactants
Anisotropic etching
Sputter deposition
Wet etching
masking
pretreatment
Self assembly
self assembly
ions

Keywords

  • Bimodal porosity
  • Mesoporous silica
  • Reactive ion etching

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

A combined top-down and bottom-up approach to fabricate silica films with bimodal porosity. / Ijichi, Kazuya; Fukuoka, Ayumu; Shimojima, Atsushi; Sugiyama, Masakazu; Okubo, Tatsuya.

In: Materials Letters, Vol. 65, No. 5, 15.03.2011, p. 828-831.

Research output: Contribution to journalArticle

Ijichi, Kazuya ; Fukuoka, Ayumu ; Shimojima, Atsushi ; Sugiyama, Masakazu ; Okubo, Tatsuya. / A combined top-down and bottom-up approach to fabricate silica films with bimodal porosity. In: Materials Letters. 2011 ; Vol. 65, No. 5. pp. 828-831.
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