A deep level transient spectroscopy study of beryllium implanted n-type 6H-SiC

X. D. Chen, S. Fung, C. D. Beling, M. Gong, T. Henkel, H. Tanoue, Naoto Kobayashi

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Abstract

Beryllium implantation induced defects in 6H-SiC pn junctions have been investigated by deep level transient spectroscopy. Five defect centers labeled BE1, BE2, BE3, BE4, and BE5 have been detected in the temperature range 100-450 K. A comparative study has also been performed in low beryllium doped n-type 6H-SiC, which proved that the BE1, BE2, and BE3 centers are electron traps located at 0.34, 0.44, and 0.53 eV, respectively, below the conduction band edge. On the other hand, the BE4 and BE5 centers have been found to be hole traps which are situated at 0.64 and 0.73 eV, respectively, above the valence band edge. Possible defect configurations associated with these deep levels are discussed.

Original languageEnglish
Pages (from-to)4558-4562
Number of pages5
JournalJournal of Applied Physics
Volume88
Issue number8
Publication statusPublished - 2000 Oct
Externally publishedYes

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ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Chen, X. D., Fung, S., Beling, C. D., Gong, M., Henkel, T., Tanoue, H., & Kobayashi, N. (2000). A deep level transient spectroscopy study of beryllium implanted n-type 6H-SiC. Journal of Applied Physics, 88(8), 4558-4562.