A kinetic study of the chemical vapor deposition of silicon carbide from dichlorodimethylsilane precursors

T. Takeuchi, Y. Egashira, Toshio Ohsawa, H. Komiyama

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

Silicon carbide (SiC) films were prepared from dichlorodimethylsilane (DDS) precursors at temperatures ranging from 1173 to 1373 K by atmospheric pressure chemical vapor deposition (APCVD). A comprehensive model of the chemical vapor deposition of SiC from DDS was developed, which includes gas-to-surface mass transfer, surface sticking, and gasphase chemistry. This model successfully reproduced our experimental results as well as those previously reported in the literature. This model assumed that the gas-phase chemistry consists of two reaction paths to form SiC: (i) gas-phase decomposition of DDS to form a growth species, most plausibly initiated by the fission reaction of the Si-C bond in DDS, followed by sticking on the surface and (ii) polymerization between this growth species and DDS, followed by deposition on the surface. The relative importance of mass transfer relative to chemical reactions in the gas phase was also determined.

Original languageEnglish
Pages (from-to)1277-1284
Number of pages8
JournalJournal of the Electrochemical Society
Volume145
Issue number4
Publication statusPublished - 1998 Apr
Externally publishedYes

Fingerprint

Silicon carbide
silicon carbides
Chemical vapor deposition
vapor deposition
Gases
Kinetics
kinetics
vapor phases
mass transfer
Mass transfer
Fission reactions
chemistry
Atmospheric pressure
fission
Chemical reactions
chemical reactions
atmospheric pressure
polymerization
Polymerization
Decomposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Materials Chemistry
  • Electrochemistry

Cite this

A kinetic study of the chemical vapor deposition of silicon carbide from dichlorodimethylsilane precursors. / Takeuchi, T.; Egashira, Y.; Ohsawa, Toshio; Komiyama, H.

In: Journal of the Electrochemical Society, Vol. 145, No. 4, 04.1998, p. 1277-1284.

Research output: Contribution to journalArticle

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