A novel process for fabrication of gated silicon field emitter array taking advantage of ion bombardment retarded etching

Takashi Tanii*, Satoru Fujita, Yoshiteru Numao, Iwao Matsuya, Mitsuaki Sakairi, Meishoku Masahara, Iwao Ohdomari

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

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