A simple lithographic method employing 172 nm vacuum ultraviolet light to prepare positive- and negative-tone poly(methyl methacrylate) patterns

S. Asakura, A. Hozumi, Tadashi Yamaguchi, A. Fuwa

    Research output: Contribution to journalArticle

    8 Citations (Scopus)

    Abstract

    We successfully prepared both positive- and negative-tone patterns by applying poly(methyl methacrylate) (PMMA) as a photoresist. A positive-pattern was prepared by lithography through a photomask using 172 nm vacuum ultraviolet (VUV) light under the pressure of 103 Pa. A negative-pattern was prepared using the same VUV light under the reduced pressure of 10 Pa, followed by rinsing with toluene solution. At 103 Pa, the irradiated PMMA was effectively decomposed and eliminated. On the other hand, at 10 Pa, the irradiated PMMA became cured and resistant to etching. We subsequently utilized these positive- and negative-tone patterns as templates on indium-tin-oxide surfaces to electrodeposit copper microstructures with 10 μm lines and spaces.

    Original languageEnglish
    Pages (from-to)237-240
    Number of pages4
    JournalThin Solid Films
    Volume500
    Issue number1-2
    DOIs
    Publication statusPublished - 2006 Apr 3

    Fingerprint

    Polymethyl Methacrylate
    Polymethyl methacrylates
    polymethyl methacrylate
    ultraviolet radiation
    Vacuum
    vacuum
    Photomasks
    Toluene
    Photoresists
    Tin oxides
    Indium
    Lithography
    photomasks
    Copper
    Etching
    photoresists
    indium oxides
    tin oxides
    toluene
    Microstructure

    Keywords

    • Atomic force microscopy
    • Photoresist
    • Poly(methyl)methacrylate
    • Vacuum ultraviolet

    ASJC Scopus subject areas

    • Surfaces, Coatings and Films
    • Condensed Matter Physics
    • Surfaces and Interfaces

    Cite this

    A simple lithographic method employing 172 nm vacuum ultraviolet light to prepare positive- and negative-tone poly(methyl methacrylate) patterns. / Asakura, S.; Hozumi, A.; Yamaguchi, Tadashi; Fuwa, A.

    In: Thin Solid Films, Vol. 500, No. 1-2, 03.04.2006, p. 237-240.

    Research output: Contribution to journalArticle

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    AU - Fuwa, A.

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