A-site-modified perovskite nanosheets and their integration into high-κ dielectric thin films with a clean interface

Bao Wen Li, Minoru Osada, Tadashi C. Ozawa, Kosho Akatsuka, Yasuo Ebina, Renzi Ma, Kanta Ono, Hiroshi Funakubo, Takayoshi Sasaki

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Abstract

We investigated dielectric properties of La1-xEu xNb2O7 perovskite nanosheets in order to study the effect of A-site modification on dielectric properties. Langmuir-Blodgett deposition was employed to fabricate multilayer nanofilms of perovskite nanosheets. In these nanosheets, A-site modification with Eu3+ ions improves the leakage current characteristics and, at the same time, reduces permittivity. The slight modification with Eu3+ ions in La0.95Nb 2O7 nanosheets causes a 50% reduction in εr value. We also discuss the high-κ properties of La 0.95Nb2O7 nanosheets by performing detailed investigations based on first-principles calculations and interfacial structures.

Original languageEnglish
Article number09MA01
JournalJapanese Journal of Applied Physics
Volume49
Issue number9 PART 2
DOIs
Publication statusPublished - 2010 Sep
Externally publishedYes

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ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Li, B. W., Osada, M., Ozawa, T. C., Akatsuka, K., Ebina, Y., Ma, R., Ono, K., Funakubo, H., & Sasaki, T. (2010). A-site-modified perovskite nanosheets and their integration into high-κ dielectric thin films with a clean interface. Japanese Journal of Applied Physics, 49(9 PART 2), [09MA01]. https://doi.org/10.1143/JJAP.49.09MA01