Ab initio molecular orbital study of the electron emission mechanism of TiCl3 as a reductant for an electroless deposition process

Takuya Shimada, Isao Komatsu, Takayuki Homma, Hiromi Nakai, Tetsuya Osaka

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5 Citations (Scopus)

Abstract

The oxidation mechanism of TiCl3 as a reductant for an electroless deposition process was studied by ab initio molecular orbital method. The reaction process of TiCl3 proceeds with the substitution of Cl- to OH-. Net charge and spin density of the reactant, product, and intermediates were evaluated. It was suggested that the electron emission of TiCl3, which is originated by the oxidation of Ti(III) to Ti(IV), took place when Cl is replaced by OH- to form Ti(OH)4. The catalytic activity of the metal surface, which is one of the most important factors for the electroless deposition process, was studied using a Pd4 cluster as a model surface. It was suggested that the Pd4 cluster enhanced the reaction of TiCl3 to emit the electron. The effect of solvation is also taken into account in terms of the dielectric field constant. It was indicated that the heat of oxidation reaction shifted to an exothermic reaction with decreasing dielectric constant, indicating that the reaction preferentially proceeds in the vicinity of solid/liquid interface. However, it was indicated that the reaction could proceed in the bulk solution, suggesting that appropriate stabilization such as formation of complex is required for the application of the TiCl3 to the electroless deposition process.

Original languageEnglish
Pages (from-to)462-465
Number of pages4
JournalElectrochemistry
Volume72
Issue number6
Publication statusPublished - 2004 Jun

Fingerprint

Electroless plating
Electron emission
Reducing Agents
Molecular orbitals
Oxidation
Exothermic reactions
Solvation
Catalyst activity
Permittivity
Substitution reactions
Stabilization
Electrons
Liquids
Metals
titanium trichloride
hydroxide ion

Keywords

  • Effect of Solvation
  • Electroless Deposition Process
  • Molecular Orbital Study
  • TiCl

ASJC Scopus subject areas

  • Electrochemistry

Cite this

@article{4d6d1dde6dbb437ebf752c3a542e084e,
title = "Ab initio molecular orbital study of the electron emission mechanism of TiCl3 as a reductant for an electroless deposition process",
abstract = "The oxidation mechanism of TiCl3 as a reductant for an electroless deposition process was studied by ab initio molecular orbital method. The reaction process of TiCl3 proceeds with the substitution of Cl- to OH-. Net charge and spin density of the reactant, product, and intermediates were evaluated. It was suggested that the electron emission of TiCl3, which is originated by the oxidation of Ti(III) to Ti(IV), took place when Cl is replaced by OH- to form Ti(OH)4. The catalytic activity of the metal surface, which is one of the most important factors for the electroless deposition process, was studied using a Pd4 cluster as a model surface. It was suggested that the Pd4 cluster enhanced the reaction of TiCl3 to emit the electron. The effect of solvation is also taken into account in terms of the dielectric field constant. It was indicated that the heat of oxidation reaction shifted to an exothermic reaction with decreasing dielectric constant, indicating that the reaction preferentially proceeds in the vicinity of solid/liquid interface. However, it was indicated that the reaction could proceed in the bulk solution, suggesting that appropriate stabilization such as formation of complex is required for the application of the TiCl3 to the electroless deposition process.",
keywords = "Effect of Solvation, Electroless Deposition Process, Molecular Orbital Study, TiCl",
author = "Takuya Shimada and Isao Komatsu and Takayuki Homma and Hiromi Nakai and Tetsuya Osaka",
year = "2004",
month = "6",
language = "English",
volume = "72",
pages = "462--465",
journal = "Electrochemistry",
issn = "1344-3542",
publisher = "Electrochemical Society of Japan",
number = "6",

}

TY - JOUR

T1 - Ab initio molecular orbital study of the electron emission mechanism of TiCl3 as a reductant for an electroless deposition process

AU - Shimada, Takuya

AU - Komatsu, Isao

AU - Homma, Takayuki

AU - Nakai, Hiromi

AU - Osaka, Tetsuya

PY - 2004/6

Y1 - 2004/6

N2 - The oxidation mechanism of TiCl3 as a reductant for an electroless deposition process was studied by ab initio molecular orbital method. The reaction process of TiCl3 proceeds with the substitution of Cl- to OH-. Net charge and spin density of the reactant, product, and intermediates were evaluated. It was suggested that the electron emission of TiCl3, which is originated by the oxidation of Ti(III) to Ti(IV), took place when Cl is replaced by OH- to form Ti(OH)4. The catalytic activity of the metal surface, which is one of the most important factors for the electroless deposition process, was studied using a Pd4 cluster as a model surface. It was suggested that the Pd4 cluster enhanced the reaction of TiCl3 to emit the electron. The effect of solvation is also taken into account in terms of the dielectric field constant. It was indicated that the heat of oxidation reaction shifted to an exothermic reaction with decreasing dielectric constant, indicating that the reaction preferentially proceeds in the vicinity of solid/liquid interface. However, it was indicated that the reaction could proceed in the bulk solution, suggesting that appropriate stabilization such as formation of complex is required for the application of the TiCl3 to the electroless deposition process.

AB - The oxidation mechanism of TiCl3 as a reductant for an electroless deposition process was studied by ab initio molecular orbital method. The reaction process of TiCl3 proceeds with the substitution of Cl- to OH-. Net charge and spin density of the reactant, product, and intermediates were evaluated. It was suggested that the electron emission of TiCl3, which is originated by the oxidation of Ti(III) to Ti(IV), took place when Cl is replaced by OH- to form Ti(OH)4. The catalytic activity of the metal surface, which is one of the most important factors for the electroless deposition process, was studied using a Pd4 cluster as a model surface. It was suggested that the Pd4 cluster enhanced the reaction of TiCl3 to emit the electron. The effect of solvation is also taken into account in terms of the dielectric field constant. It was indicated that the heat of oxidation reaction shifted to an exothermic reaction with decreasing dielectric constant, indicating that the reaction preferentially proceeds in the vicinity of solid/liquid interface. However, it was indicated that the reaction could proceed in the bulk solution, suggesting that appropriate stabilization such as formation of complex is required for the application of the TiCl3 to the electroless deposition process.

KW - Effect of Solvation

KW - Electroless Deposition Process

KW - Molecular Orbital Study

KW - TiCl

UR - http://www.scopus.com/inward/record.url?scp=3142658623&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=3142658623&partnerID=8YFLogxK

M3 - Article

VL - 72

SP - 462

EP - 465

JO - Electrochemistry

JF - Electrochemistry

SN - 1344-3542

IS - 6

ER -