Ablation threshold and crater morphology of amorphous and crystalline SiO2 glass for extreme ultraviolet femtosecond pulses

T. Shibuya, K. Sakaue, H. Ogawa, T. H. Dinh, D. Satoh, E. Terasawa, M. Washio, M. Tanaka, T. Higashiguchi, M. Ishino, Y. Kubota, Y. Inubushi, S. Owada, M. Nishikino, Y. Kobayashi, R. Kuroda

Research output: Contribution to journalArticlepeer-review

Abstract

The ablation threshold fluence and crater morphology of amorphous and crystalline SiO2 glass were analyzed in the regime of an extreme ultraviolet femtosecond pulse. Despite the difference between the densities (or optical penetration depths) of amorphous and crystalline SiO2 glass, the ablation threshold fluences and crater morphologies were found to be comparable. In addition, we compared our experimental results at a 10.3 nm wavelength with those in a previous work at a 13.5 nm wavelength. We conclude that the impact of the difference in density or optical penetration depth of several tens of percent on the ablation process is limited.

Original languageEnglish
Article number122004
JournalJapanese journal of applied physics
Volume59
Issue number12
DOIs
Publication statusPublished - 2020 Dec 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Ablation threshold and crater morphology of amorphous and crystalline SiO<sub>2</sub> glass for extreme ultraviolet femtosecond pulses'. Together they form a unique fingerprint.

Cite this