TY - JOUR
T1 - Adsorption of organic molecules by photochemical reaction on Cl:Si(1 1 1) and H:Si(1 1 1) evaluated by HREELS
AU - Nishiyama, Katsuhiko
AU - Tanaka, Yosuke
AU - Harada, Hiroshi
AU - Yamada, Taro
AU - Niwa, Daisuke
AU - Inoue, Tomoyuki
AU - Homma, Takayuki
AU - Osaka, Tetsuya
AU - Taniguchi, Isao
N1 - Funding Information:
This work was supported by the Research for the Future Project ‘Wafer-Scale Formation Process of Nano Dots’, the Japan Society for the Promotion of Science, Iketani Science and Technology Foundation, the Murata Science Foundation, and Yazaki Memorial Foundation for Science and Technology. The authors are also grateful to Prof. Akira Nakada and Prof. Hiroshi Kubota of Kumamoto University for their assistance in improving our experimental setup. The authors are indebted to Kitano Seiki Co., Ltd. for leasing their valuable equipment for this research.
PY - 2006/5/15
Y1 - 2006/5/15
N2 - The covalent attachment of alkyl groups to silicon surfaces, via carbon-silicon bond formation, has been attempted using gas-surface reactions starting from Cl-terminated Si(1 1 1) or H:Si(1 1 1) under ultraviolet light irradiation. The formation of Cl-terminated Si(1 1 1) and its resulting stability were examined prior to deposition of organic molecules. High-resolution electron energy loss spectroscopy (HREELS) was utilized for detecting surface-bound adsorbates. The detection of photo-deposited organic species on Cl:Si(1 1 1) from gas-phase CH4 or CH2{double bond, long}CH2 was not significant. On H:Si(1 1 1), it was evident that after the photoreaction with gas-phase C2H5Cl, C2H5 groups were chemically bonded to the surface Si atoms through single covalent bonds. The C2H5 groups were thermally stable at temperatures below 600 K. Alkyl monolayers prepared on silicon surfaces by dry process will lead to a new prospective technology of nanoscale fabrication and biochemical applications.
AB - The covalent attachment of alkyl groups to silicon surfaces, via carbon-silicon bond formation, has been attempted using gas-surface reactions starting from Cl-terminated Si(1 1 1) or H:Si(1 1 1) under ultraviolet light irradiation. The formation of Cl-terminated Si(1 1 1) and its resulting stability were examined prior to deposition of organic molecules. High-resolution electron energy loss spectroscopy (HREELS) was utilized for detecting surface-bound adsorbates. The detection of photo-deposited organic species on Cl:Si(1 1 1) from gas-phase CH4 or CH2{double bond, long}CH2 was not significant. On H:Si(1 1 1), it was evident that after the photoreaction with gas-phase C2H5Cl, C2H5 groups were chemically bonded to the surface Si atoms through single covalent bonds. The C2H5 groups were thermally stable at temperatures below 600 K. Alkyl monolayers prepared on silicon surfaces by dry process will lead to a new prospective technology of nanoscale fabrication and biochemical applications.
KW - Alkyl adsorbate
KW - C-Si covalent bond
KW - Chlorine-terminated Si(1 1 1)
KW - HREELS
KW - Hydrogen-terminated Si(1 1 1)
KW - Photochemical reaction
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U2 - 10.1016/j.susc.2006.02.046
DO - 10.1016/j.susc.2006.02.046
M3 - Article
AN - SCOPUS:33646368126
SN - 0039-6028
VL - 600
SP - 1965
EP - 1972
JO - Surface Science
JF - Surface Science
IS - 10
ER -