Advanced capacitor technology based on two-dimensional nanosheets

Hyung Jun Kim, Minoru Osada, Takayoshi Sasaki

Research output: Contribution to journalReview article

3 Citations (Scopus)

Abstract

As electronics continue to decrease in size, new classes of materials are necessary to continue this downsizing trend. Of particular importance is the development of high-performance capacitors based on dielectric films. Ultrathin high-k dielectrics are expected to be key to future applications. Recently, we have developed new high-k nanodielectrics based on molecularly thin oxide nanosheets [Ti0.87O2, Ti2NbO7, (Ca,Sr)2Nb3O10]. Newly developed nanosheets exhibited the highest permittivity (ϵr > 100) ever realized in all known dielectrics in the ultrathin region (<10 nm). In this review, we present recent progress in dielectric nanosheets, highlighting emerging functionalities in capacitor applications.

Original languageEnglish
Article number1102A3
JournalJapanese Journal of Applied Physics
Volume55
Issue number11
DOIs
Publication statusPublished - 2016 Nov 1
Externally publishedYes

Fingerprint

Nanosheets
capacitors
Capacitors
Dielectric films
Permittivity
Electronic equipment
emerging
Oxides
permittivity
trends
oxides
electronics

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Advanced capacitor technology based on two-dimensional nanosheets. / Kim, Hyung Jun; Osada, Minoru; Sasaki, Takayoshi.

In: Japanese Journal of Applied Physics, Vol. 55, No. 11, 1102A3, 01.11.2016.

Research output: Contribution to journalReview article

Kim, Hyung Jun ; Osada, Minoru ; Sasaki, Takayoshi. / Advanced capacitor technology based on two-dimensional nanosheets. In: Japanese Journal of Applied Physics. 2016 ; Vol. 55, No. 11.
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