Advantage of highly concentrated (≥90%) ozone for chemical vapor deposition SiO2 grown under 200 °c using hexamethyldisilazane and ultraviolet light excited ozone

Naoto Kameda*, Tetsuya Nishiguchi, Yoshiki Morikawa, Mitsuru Kekura, Hidehiko Nonaka, Shingo Ichimura

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

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