AFM Tip Characterizer fabricated by Si/SiO2 multilayers

Hisataka Takenaka, Masatoshi Hatayama, Hisashi Ito, Tadayuki Ohchi, Akio Takano, Satoru Kurosawa, Hiroshi Itoh, Shingo Ichimura

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO2 multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

Original languageEnglish
Pages (from-to)293-296
Number of pages4
Journale-Journal of Surface Science and Nanotechnology
Volume9
DOIs
Publication statusPublished - 2011 Jul 16
Externally publishedYes

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Keywords

  • Atomic force microscopy
  • Multilayer
  • Si/SiO
  • Tip characterizer

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Mechanics of Materials
  • Biotechnology
  • Bioengineering

Cite this

Takenaka, H., Hatayama, M., Ito, H., Ohchi, T., Takano, A., Kurosawa, S., Itoh, H., & Ichimura, S. (2011). AFM Tip Characterizer fabricated by Si/SiO2 multilayers. e-Journal of Surface Science and Nanotechnology, 9, 293-296. https://doi.org/10.1380/ejssnt.2011.293