Alkyl monolayers on Si(111) as ultrathin electron-beam patterning media

Taro Yamada, Nao Takano, Keiko Yamada, Shuhei Yoshitomi, Tomoyuki Inoue, Tetsuya Osaka

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

A process of electron-beam patterning of the surface of a Si(111) wafer was developed by utilizing alkyl monolayers as ultrathin patterning media. We performed chemical benchmark tests of the electron-beam patterning of alkyl monolayers on Si(111) in ambient oxygen, followed by the deposition of a metal on bombarded areas by immersion into an aqueous solution containing metal ions of the metal to be deposited. We investigated practically important issues related to this process, such as the robustness of organic monolayers against oxidation in aqueous media, the contrast enhancement of the bombarded areas by metal deposition, and the detectability of electron-bombarded areas of the monolayers by scanning tunneling microscopy (STM). The alkyl-covered Si(111) surface was significantly resistant to the oxidation by dissolved O2 in pure water, compared to hydrogen-terminated Si(111). By immersion into a solution containing CuSO4+HF+NH4F, electron-bombarded areas were visualized by the presence of the deposit of Cu. Electron-bombarded areas were also distinguishable from intact areas in terms of height contrast or roughness measured by STM. These results indicate the usefulness of alkyl monolayers for nano-scale patterning on silicon wafers.

Original languageEnglish
Pages (from-to)247-254
Number of pages8
JournalJournal of Electroanalytical Chemistry
Volume532
Issue number1-2
DOIs
Publication statusPublished - 2002 Sep 6

Fingerprint

Electron beams
Monolayers
Metals
Scanning tunneling microscopy
Electrons
Oxidation
Silicon wafers
Contrast Media
Metal ions
Hydrogen
Deposits
Surface roughness
Oxygen
Water

Keywords

  • Electron-beam patterning
  • Metal deposition
  • Nanometer-scale fabrication
  • Organic monolayer
  • Oxidation
  • Si(111) wafer

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Analytical Chemistry
  • Electrochemistry

Cite this

Alkyl monolayers on Si(111) as ultrathin electron-beam patterning media. / Yamada, Taro; Takano, Nao; Yamada, Keiko; Yoshitomi, Shuhei; Inoue, Tomoyuki; Osaka, Tetsuya.

In: Journal of Electroanalytical Chemistry, Vol. 532, No. 1-2, 06.09.2002, p. 247-254.

Research output: Contribution to journalArticle

Yamada, Taro ; Takano, Nao ; Yamada, Keiko ; Yoshitomi, Shuhei ; Inoue, Tomoyuki ; Osaka, Tetsuya. / Alkyl monolayers on Si(111) as ultrathin electron-beam patterning media. In: Journal of Electroanalytical Chemistry. 2002 ; Vol. 532, No. 1-2. pp. 247-254.
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