Amorphous indium-tin-zinc oxide films deposited by magnetron sputtering with various reactive gases: Spatial distribution of thin film transistor performance

Junjun Jia, Yoshifumi Torigoshi, Emi Kawashima, Futoshi Utsuno, Koki Yano, Yuzo Shigesato

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)

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Physics & Astronomy