Amorphous-to-crystalline transition during the early stages of thin film growth of Cr on SiO2

Minghui Hu; Suguru Noda; Hiroshi Komiyama

doi:10.1063/1.1571214

Amorphous-to-crystalline transition during the early stages of thin film growth of Cr on SiO₂

Minghui Hu^*, Suguru Noda, Hiroshi Komiyama

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

A study was performed on amorphous-to-crystalline transition during the early stages of thin film growth. Transmission electron microscopy was used to study the growth of sputter-deposited chromium thin films on silica. The existence of interfacial Cr-O interactions was confirmed by the depth profile analysis by x-ray photoelectron spectroscopy.

Original language	English
Pages (from-to)	9336-9344
Number of pages	9
Journal	Journal of Applied Physics
Volume	93
Issue number	11
DOIs	https://doi.org/10.1063/1.1571214
Publication status	Published - 2003 Jun 1
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1063/1.1571214

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title = "Amorphous-to-crystalline transition during the early stages of thin film growth of Cr on SiO2",

abstract = "A study was performed on amorphous-to-crystalline transition during the early stages of thin film growth. Transmission electron microscopy was used to study the growth of sputter-deposited chromium thin films on silica. The existence of interfacial Cr-O interactions was confirmed by the depth profile analysis by x-ray photoelectron spectroscopy.",

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AU - Komiyama, Hiroshi

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N2 - A study was performed on amorphous-to-crystalline transition during the early stages of thin film growth. Transmission electron microscopy was used to study the growth of sputter-deposited chromium thin films on silica. The existence of interfacial Cr-O interactions was confirmed by the depth profile analysis by x-ray photoelectron spectroscopy.

AB - A study was performed on amorphous-to-crystalline transition during the early stages of thin film growth. Transmission electron microscopy was used to study the growth of sputter-deposited chromium thin films on silica. The existence of interfacial Cr-O interactions was confirmed by the depth profile analysis by x-ray photoelectron spectroscopy.

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Amorphous-to-crystalline transition during the early stages of thin film growth of Cr on SiO₂

Abstract

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