Amorphous-to-crystalline transition during the early stages of thin film growth of Cr on SiO2

Minghui Hu, Suguru Noda, Hiroshi Komiyama

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

A study was performed on amorphous-to-crystalline transition during the early stages of thin film growth. Transmission electron microscopy was used to study the growth of sputter-deposited chromium thin films on silica. The existence of interfacial Cr-O interactions was confirmed by the depth profile analysis by x-ray photoelectron spectroscopy.

Original languageEnglish
Pages (from-to)9336-9344
Number of pages9
JournalJournal of Applied Physics
Volume93
Issue number11
DOIs
Publication statusPublished - 2003 Jun 1
Externally publishedYes

Fingerprint

thin films
x ray spectroscopy
chromium
photoelectron spectroscopy
silicon dioxide
transmission electron microscopy
profiles
interactions

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Amorphous-to-crystalline transition during the early stages of thin film growth of Cr on SiO2 . / Hu, Minghui; Noda, Suguru; Komiyama, Hiroshi.

In: Journal of Applied Physics, Vol. 93, No. 11, 01.06.2003, p. 9336-9344.

Research output: Contribution to journalArticle

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