An optical grating filter dry-etched on a LiNbO3 substrate

Satoshi Shinada, Tetsuya Kawanishi, Takahide Sakamoto, Masayuki Izutsu

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We fabricated an etched grating filter on a Ti-diffused waveguide in LiNbO3 using inductively coupled plasma etching with C 4F8/Ar as an etching gas, which has an etching rate of 85.1 nm/min. The etched grating filter had a reflectivity of 35% and a bandwidth of 0.02 nm. Maximum reflectivity was obtained when the electric field of an incident beam was perpendicular to the grating.

Original languageEnglish
Pages (from-to)347-352
Number of pages6
JournalIEICE Electronics Express
Volume3
Issue number14
DOIs
Publication statusPublished - 2006 Jul 25
Externally publishedYes

Fingerprint

Diffraction gratings
Etching
gratings
filters
Plasma etching
Inductively coupled plasma
Substrates
etching
reflectance
Waveguides
Gases
Electric fields
plasma etching
Bandwidth
waveguides
bandwidth
electric fields
gases
lithium niobate

Keywords

  • Dry etching, grating
  • ICP
  • LiNbO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

An optical grating filter dry-etched on a LiNbO3 substrate. / Shinada, Satoshi; Kawanishi, Tetsuya; Sakamoto, Takahide; Izutsu, Masayuki.

In: IEICE Electronics Express, Vol. 3, No. 14, 25.07.2006, p. 347-352.

Research output: Contribution to journalArticle

Shinada, Satoshi ; Kawanishi, Tetsuya ; Sakamoto, Takahide ; Izutsu, Masayuki. / An optical grating filter dry-etched on a LiNbO3 substrate. In: IEICE Electronics Express. 2006 ; Vol. 3, No. 14. pp. 347-352.
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