We fabricated an etched grating filter on a Ti-diffused waveguide in LiNbO3 using inductively coupled plasma etching with C 4F8/Ar as an etching gas, which has an etching rate of 85.1 nm/min. The etched grating filter had a reflectivity of 35% and a bandwidth of 0.02 nm. Maximum reflectivity was obtained when the electric field of an incident beam was perpendicular to the grating.
- Dry etching, grating
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering