Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group

K. Kato, Takeo Miyake, Y. Beppu, Takashi Tanii, I. Ohdomari

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
Pages60-61
Number of pages2
DOIs
Publication statusPublished - 2007
Events20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto
Duration: 2007 Nov 52007 Nov 8

Other

Others20th International Microprocesses and Nanotechnology Conference, MNC 2007
CityKyoto
Period07/11/507/11/8

Fingerprint

Electron beams
Monolayers

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Kato, K., Miyake, T., Beppu, Y., Tanii, T., & Ohdomari, I. (2007). Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC (pp. 60-61). [4456104] https://doi.org/10.1109/IMNC.2007.4456104

Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group. / Kato, K.; Miyake, Takeo; Beppu, Y.; Tanii, Takashi; Ohdomari, I.

Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 60-61 4456104.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kato, K, Miyake, T, Beppu, Y, Tanii, T & Ohdomari, I 2007, Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group. in Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC., 4456104, pp. 60-61, s20th International Microprocesses and Nanotechnology Conference, MNC 2007, Kyoto, 07/11/5. https://doi.org/10.1109/IMNC.2007.4456104
Kato K, Miyake T, Beppu Y, Tanii T, Ohdomari I. Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 60-61. 4456104 https://doi.org/10.1109/IMNC.2007.4456104
Kato, K. ; Miyake, Takeo ; Beppu, Y. ; Tanii, Takashi ; Ohdomari, I. / Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. pp. 60-61
@inproceedings{bcee4ace71d64812bc169e937b9500b1,
title = "Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group",
author = "K. Kato and Takeo Miyake and Y. Beppu and Takashi Tanii and I. Ohdomari",
year = "2007",
doi = "10.1109/IMNC.2007.4456104",
language = "English",
isbn = "4990247248",
pages = "60--61",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",

}

TY - GEN

T1 - Analysis of electron beam sensitivity of self-assem bled monolayer resist depending on terminal group

AU - Kato, K.

AU - Miyake, Takeo

AU - Beppu, Y.

AU - Tanii, Takashi

AU - Ohdomari, I.

PY - 2007

Y1 - 2007

UR - http://www.scopus.com/inward/record.url?scp=47349091759&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=47349091759&partnerID=8YFLogxK

U2 - 10.1109/IMNC.2007.4456104

DO - 10.1109/IMNC.2007.4456104

M3 - Conference contribution

SN - 4990247248

SN - 9784990247249

SP - 60

EP - 61

BT - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

ER -