Anisotropic oxygen reactive ion etching for removing residual layers from 45 nm-width imprint patterns

Takuya Uehara, Shoichi Kubo, Nobuya Hiroshiba, Masaru Nakagawa*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds