Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

M. Zhao, H. Oigawa, J. Ji, T. Ueda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.

Original languageEnglish
Title of host publicationProceedings of IEEE Sensors
Pages1693-1696
Number of pages4
DOIs
Publication statusPublished - 2011
Event10th IEEE SENSORS Conference 2011, SENSORS 2011 - Limerick
Duration: 2011 Oct 282011 Oct 31

Other

Other10th IEEE SENSORS Conference 2011, SENSORS 2011
CityLimerick
Period11/10/2811/10/31

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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  • Cite this

    Zhao, M., Oigawa, H., Ji, J., & Ueda, T. (2011). Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer. In Proceedings of IEEE Sensors (pp. 1693-1696). [6127322] https://doi.org/10.1109/ICSENS.2011.6127322