Application of metal cluster complex ion beam for low damage sputtering

Toshiyuki Fujimoto, Takeshi Mizota, Hidehiko Nonaka, Akira Kurokawa, Shingo Ichimura

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.

Original languageEnglish
Pages (from-to)164-166
Number of pages3
JournalSurface and Interface Analysis
Volume37
Issue number2
DOIs
Publication statusPublished - 2005 Feb 1
Externally publishedYes

Fingerprint

metal clusters
Ion beams
Sputtering
sputtering
Metals
ion beams
jet nozzles
damage
inks
Ink
craters
Ionization
sprayers
Nozzles
Carbon
ionization
carbon

Keywords

  • Cluster ion bean
  • Low damage sputtering
  • Metal cluster complex

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Application of metal cluster complex ion beam for low damage sputtering. / Fujimoto, Toshiyuki; Mizota, Takeshi; Nonaka, Hidehiko; Kurokawa, Akira; Ichimura, Shingo.

In: Surface and Interface Analysis, Vol. 37, No. 2, 01.02.2005, p. 164-166.

Research output: Contribution to journalArticle

Fujimoto, Toshiyuki ; Mizota, Takeshi ; Nonaka, Hidehiko ; Kurokawa, Akira ; Ichimura, Shingo. / Application of metal cluster complex ion beam for low damage sputtering. In: Surface and Interface Analysis. 2005 ; Vol. 37, No. 2. pp. 164-166.
@article{e99ef591217840e3ba3c88607eb57cc7,
title = "Application of metal cluster complex ion beam for low damage sputtering",
abstract = "Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.",
keywords = "Cluster ion bean, Low damage sputtering, Metal cluster complex",
author = "Toshiyuki Fujimoto and Takeshi Mizota and Hidehiko Nonaka and Akira Kurokawa and Shingo Ichimura",
year = "2005",
month = "2",
day = "1",
doi = "10.1002/sia.l955",
language = "English",
volume = "37",
pages = "164--166",
journal = "Surface and Interface Analysis",
issn = "0142-2421",
publisher = "John Wiley and Sons Ltd",
number = "2",

}

TY - JOUR

T1 - Application of metal cluster complex ion beam for low damage sputtering

AU - Fujimoto, Toshiyuki

AU - Mizota, Takeshi

AU - Nonaka, Hidehiko

AU - Kurokawa, Akira

AU - Ichimura, Shingo

PY - 2005/2/1

Y1 - 2005/2/1

N2 - Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.

AB - Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro-spray-like ionization using an ink-jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater-like hole at the carbon sheet.

KW - Cluster ion bean

KW - Low damage sputtering

KW - Metal cluster complex

UR - http://www.scopus.com/inward/record.url?scp=13244249779&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=13244249779&partnerID=8YFLogxK

U2 - 10.1002/sia.l955

DO - 10.1002/sia.l955

M3 - Article

AN - SCOPUS:13244249779

VL - 37

SP - 164

EP - 166

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

SN - 0142-2421

IS - 2

ER -