Application of pulse-heating method to electroless ni alloy as a thin-film resistor

The effect of heat treatment on electroless ternary NiMoB and NiWP, and binary NiB alloy films was investigated us- ing a pulse-heating method that provides a very high heating rate (up to 106 K min-1) and a very short heating time (200- 1000 ms). The electroless ternary alloy System gives quite different behavior when using the puise or conventional long- term heat treatment. Namely, ternary alloys in the form of film become close to pure Ni, rather than a NiMo or NiW solid solution when being pulse-heated, while no such a behavior is observed with the conventional heat treatment. For the binary electroless NiB alloy film, the behavior is similar to that in the NiP alloy System already reported. However, with faster heating rates the NiB alloy tends to behave similarly to the ternary alloys.