Applications and leading-edge technology

Jun Taniguchi*, Hidetoshi Shinohara, Jun Mizuno, Mitsunori Kokubo, Kazutoshi Yakemoto, Hiroshi Goto

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingChapter


This chapter outlines the advanced nanoimprinting technologies and its applications, and describes the worldwide trends in nanoimprinting technologies and topics related to them. The resolution limit of nanoimprint lithography (NIL) is mentioned, improved nanoimprinting technologies are introduced, and roll-to-roll nanoimprinting technologies are described. The resolution limit of NIL depends on the fineness of the molds used, and the molds are usually fabricated using electron beam lithography. The chapter explains the outline of the thermal imprint process, thermal imprint apparatus and the micro/nano melt transcription molding process. Recently, the amount of research and development on element nanoimprint technologies, including molding, demolding, and removal of residual layer, has been increasing. The imprint resin requires several functionalities, including high resolution, good demolding, and high durability against electrodeposition and dry etching. In contrast, the imprint process has been applied for many electronic, optical, and chemical/biochemical devices.

Original languageEnglish
Title of host publicationNanoimprint Technology
Subtitle of host publicationNanotransfer for Thermoplastic and Photocurable Polymers
Number of pages37
ISBN (Electronic)9781118535059
ISBN (Print)9781118359839
Publication statusPublished - 2013 Jun 18

ASJC Scopus subject areas

  • Engineering(all)


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