Area-selective surface modification of Si substrates bearing OH- and H-terminated areas by fluorescent 1-pyrenylphosphonic acid (PYPA) was achieved using chlorobenzene at 140 °C for 2 h in an autoclave. The OH-terminated area was successfully modified, as shown by X-ray photoemission spectroscopy and contact angle measurement, while no reaction proceeded between PYPA and the H-terminated area. SiO2 nanoparticles were reacted with PYPA under the same conditions to form SiOP bonds, suggesting that dehydration coupling proceeded between the OH-terminated area and PYPA.
- Area-selective surface modification
- Fluorescent organophosphoric acid
- Si substrate
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