Area-selective surface modification of si substrates with a fluorescent organophosphonic acid using the differences in reactivities of their surface terminal groups

Taro Asami, Naokazu Idota, Yoshiyuki Sugahara

    Research output: Contribution to journalArticle

    Abstract

    Area-selective surface modification of Si substrates bearing OH- and H-terminated areas by fluorescent 1-pyrenylphosphonic acid (PYPA) was achieved using chlorobenzene at 140 °C for 2 h in an autoclave. The OH-terminated area was successfully modified, as shown by X-ray photoemission spectroscopy and contact angle measurement, while no reaction proceeded between PYPA and the H-terminated area. SiO2 nanoparticles were reacted with PYPA under the same conditions to form SiOP bonds, suggesting that dehydration coupling proceeded between the OH-terminated area and PYPA.

    Original languageEnglish
    Pages (from-to)1010-1013
    Number of pages4
    JournalChemistry Letters
    Volume46
    Issue number7
    DOIs
    Publication statusPublished - 2017

    Fingerprint

    Surface treatment
    Acids
    Bearings (structural)
    Substrates
    Autoclaves
    Angle measurement
    Photoelectron spectroscopy
    X ray spectroscopy
    Dehydration
    Contact angle
    Nanoparticles
    hydroxide ion
    chlorobenzene
    2'-disulfonic acid 1-amino-8-nephthol-2

    Keywords

    • Area-selective surface modification
    • Fluorescent organophosphoric acid
    • Si substrate

    ASJC Scopus subject areas

    • Chemistry(all)

    Cite this

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    abstract = "Area-selective surface modification of Si substrates bearing OH- and H-terminated areas by fluorescent 1-pyrenylphosphonic acid (PYPA) was achieved using chlorobenzene at 140 °C for 2 h in an autoclave. The OH-terminated area was successfully modified, as shown by X-ray photoemission spectroscopy and contact angle measurement, while no reaction proceeded between PYPA and the H-terminated area. SiO2 nanoparticles were reacted with PYPA under the same conditions to form SiOP bonds, suggesting that dehydration coupling proceeded between the OH-terminated area and PYPA.",
    keywords = "Area-selective surface modification, Fluorescent organophosphoric acid, Si substrate",
    author = "Taro Asami and Naokazu Idota and Yoshiyuki Sugahara",
    year = "2017",
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    language = "English",
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    journal = "Chemistry Letters",
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    publisher = "Chemical Society of Japan",
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    T1 - Area-selective surface modification of si substrates with a fluorescent organophosphonic acid using the differences in reactivities of their surface terminal groups

    AU - Asami, Taro

    AU - Idota, Naokazu

    AU - Sugahara, Yoshiyuki

    PY - 2017

    Y1 - 2017

    N2 - Area-selective surface modification of Si substrates bearing OH- and H-terminated areas by fluorescent 1-pyrenylphosphonic acid (PYPA) was achieved using chlorobenzene at 140 °C for 2 h in an autoclave. The OH-terminated area was successfully modified, as shown by X-ray photoemission spectroscopy and contact angle measurement, while no reaction proceeded between PYPA and the H-terminated area. SiO2 nanoparticles were reacted with PYPA under the same conditions to form SiOP bonds, suggesting that dehydration coupling proceeded between the OH-terminated area and PYPA.

    AB - Area-selective surface modification of Si substrates bearing OH- and H-terminated areas by fluorescent 1-pyrenylphosphonic acid (PYPA) was achieved using chlorobenzene at 140 °C for 2 h in an autoclave. The OH-terminated area was successfully modified, as shown by X-ray photoemission spectroscopy and contact angle measurement, while no reaction proceeded between PYPA and the H-terminated area. SiO2 nanoparticles were reacted with PYPA under the same conditions to form SiOP bonds, suggesting that dehydration coupling proceeded between the OH-terminated area and PYPA.

    KW - Area-selective surface modification

    KW - Fluorescent organophosphoric acid

    KW - Si substrate

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