Atomically-Flat GaAs(001) Surface Achieved by Atomic-Hydrogen Treatment and MBE Growth of Purely Cubic-Phase GaN

Zhixin Qin, Anwei Jia, Masakazu Kobayashi, Akihiko Yoshikawa

Research output: Contribution to journalArticle

Abstract

A two-step atomic-hydrogen (atomic-H) treatment of GaAs substrate was investigated; this includes low-temperature cleaning and high-temperature smoothening of GaAs(001) substrate surface. It was found that atomically flat GaAs surface with one monolayer-height steps and ragged step edges could be obtained by the atomic-H treatment at high temperatures. Further, growth of high quality cubic GaN (c-GaN) on atomic-H treated GaAs(001) was examined by rf plasma-assisted MBE. The c-GaN epilayers were characterized by high resolution X-ray diffraction analysis. The results show that the FWHM of the X-ray rocking curve for the (002) c-GaN was as small as 70-90 arcsec and the inclusion of hexagonal GaN phase was about 0.4% (or below). This indicates that the atomic-H irradiation treatment of the GaAs substrate was an efficient method obtaining High quality c-GaN.

Original languageEnglish
Pages (from-to)950-954
Number of pages5
JournalShinku/Journal of the Vacuum Society of Japan
Volume41
Issue number11
Publication statusPublished - 1998 Nov
Externally publishedYes

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Molecular beam epitaxy
Hydrogen
Substrates
hydrogen
Epilayers
Full width at half maximum
Temperature
X ray diffraction analysis
cleaning
flat surfaces
Cleaning
Monolayers
x rays
Irradiation
inclusions
Plasmas
X rays
irradiation
high resolution
curves

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces

Cite this

Atomically-Flat GaAs(001) Surface Achieved by Atomic-Hydrogen Treatment and MBE Growth of Purely Cubic-Phase GaN. / Qin, Zhixin; Jia, Anwei; Kobayashi, Masakazu; Yoshikawa, Akihiko.

In: Shinku/Journal of the Vacuum Society of Japan, Vol. 41, No. 11, 11.1998, p. 950-954.

Research output: Contribution to journalArticle

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