Attachment of the sulfonic acid group in the interlayer space of a layered alkali silicate, octosilicate

Takanori Nakamura, Makoto Ogawa

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

The surface modification of a layered alkali silicate, octosilicate (Na 2Si 8O 17•nH2O), with a sulfonic acid group was conducted. The sulfonic acid group was attached to the silicate layer by the reaction of octosilicate with phenethyl(dichloro)methylsilane and the subsequent sulfonation of the attached phenethyl groups with chlorosulfonic acid. The modified octosilicate is a solid acid as indicated by the intercalation of dodecylamine. A systematic expansion of the interlayer space was observed by the ion exchange with a series of alkyltrimethylammonium ions to show the variation of the layer charge density.

Original languageEnglish
Pages (from-to)7505-7511
Number of pages7
JournalLangmuir
Volume28
Issue number19
DOIs
Publication statusPublished - 2012 May 15

Fingerprint

Silicates
Sulfonic Acids
sulfonic acid
Alkalies
attachment
interlayers
alkalies
silicates
Acids
Sulfonation
acids
Intercalation
Charge density
intercalation
Surface treatment
Ion exchange
ions
Ions
expansion
octosilicate

ASJC Scopus subject areas

  • Electrochemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Materials Science(all)
  • Spectroscopy

Cite this

Attachment of the sulfonic acid group in the interlayer space of a layered alkali silicate, octosilicate. / Nakamura, Takanori; Ogawa, Makoto.

In: Langmuir, Vol. 28, No. 19, 15.05.2012, p. 7505-7511.

Research output: Contribution to journalArticle

Nakamura, Takanori ; Ogawa, Makoto. / Attachment of the sulfonic acid group in the interlayer space of a layered alkali silicate, octosilicate. In: Langmuir. 2012 ; Vol. 28, No. 19. pp. 7505-7511.
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