Blue shift of photoluminescence from a-Si: H nanoball films

Yuhei Kanemoto, Hajime Sakamoto, Isamu Kato

Research output: Contribution to journalArticle

Abstract

Hydrogenated amorphous silicon (a-Si:H) nanoball films which include Si nanocrystals, are fabricated by the double-tubed coaxial-line-type microwave plasma chemical vapor deposition (DTCL-MPCVD) system. Photoluminescence (PL) is observed at room temperature after the a-Si:H nanoball films are oxidized at high temperature in air and/or pure oxygen atmosphere. In this study, the HF treatment is performed to a-Si: H nanoball. By the HFtreatment, the photoluminescence wavelength has shifted from about 740 nm to 590 nm. We have measured the diameter of Si nanocrystal using the X-Ray Diffraction (XRD) and the Transmission Electron Microscope (TEM). It is found that the diameter of the Si nanocrystal decreases from about 5.0 nm to 3.0 nm, by the HF treatment. After changing the conditions of oxidation, PL peak wavelengths are shifted from about 740 nni to 500 nm. We have determined the diameter of Si nanocrystal contained in the a-Si:H nanoball using XRD and TEM. Consequently, it is found that the diameter of Si nanocrystal becomes small from about 5.1 nm to 3.4 nm.

Original languageEnglish
Pages (from-to)557-561
Number of pages5
JournalShinku/Journal of the Vacuum Society of Japan
Volume49
Issue number9
DOIs
Publication statusPublished - 2006

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blue shift
Nanocrystals
Photoluminescence
nanocrystals
photoluminescence
Electron microscopes
electron microscopes
X ray diffraction
Wavelength
Amorphous silicon
diffraction
wavelengths
amorphous silicon
Chemical vapor deposition
x rays
Microwaves
vapor deposition
Oxygen
Plasmas
microwaves

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces

Cite this

Blue shift of photoluminescence from a-Si : H nanoball films. / Kanemoto, Yuhei; Sakamoto, Hajime; Kato, Isamu.

In: Shinku/Journal of the Vacuum Society of Japan, Vol. 49, No. 9, 2006, p. 557-561.

Research output: Contribution to journalArticle

Kanemoto, Yuhei ; Sakamoto, Hajime ; Kato, Isamu. / Blue shift of photoluminescence from a-Si : H nanoball films. In: Shinku/Journal of the Vacuum Society of Japan. 2006 ; Vol. 49, No. 9. pp. 557-561.
@article{75adc0e3a6d942998995bbd089c99a4c,
title = "Blue shift of photoluminescence from a-Si: H nanoball films",
abstract = "Hydrogenated amorphous silicon (a-Si:H) nanoball films which include Si nanocrystals, are fabricated by the double-tubed coaxial-line-type microwave plasma chemical vapor deposition (DTCL-MPCVD) system. Photoluminescence (PL) is observed at room temperature after the a-Si:H nanoball films are oxidized at high temperature in air and/or pure oxygen atmosphere. In this study, the HF treatment is performed to a-Si: H nanoball. By the HFtreatment, the photoluminescence wavelength has shifted from about 740 nm to 590 nm. We have measured the diameter of Si nanocrystal using the X-Ray Diffraction (XRD) and the Transmission Electron Microscope (TEM). It is found that the diameter of the Si nanocrystal decreases from about 5.0 nm to 3.0 nm, by the HF treatment. After changing the conditions of oxidation, PL peak wavelengths are shifted from about 740 nni to 500 nm. We have determined the diameter of Si nanocrystal contained in the a-Si:H nanoball using XRD and TEM. Consequently, it is found that the diameter of Si nanocrystal becomes small from about 5.1 nm to 3.4 nm.",
author = "Yuhei Kanemoto and Hajime Sakamoto and Isamu Kato",
year = "2006",
doi = "10.3131/jvsj.49.557",
language = "English",
volume = "49",
pages = "557--561",
journal = "Journal of the Vacuum Society of Japan",
issn = "1882-2398",
publisher = "Vacuum Society of Japan",
number = "9",

}

TY - JOUR

T1 - Blue shift of photoluminescence from a-Si

T2 - H nanoball films

AU - Kanemoto, Yuhei

AU - Sakamoto, Hajime

AU - Kato, Isamu

PY - 2006

Y1 - 2006

N2 - Hydrogenated amorphous silicon (a-Si:H) nanoball films which include Si nanocrystals, are fabricated by the double-tubed coaxial-line-type microwave plasma chemical vapor deposition (DTCL-MPCVD) system. Photoluminescence (PL) is observed at room temperature after the a-Si:H nanoball films are oxidized at high temperature in air and/or pure oxygen atmosphere. In this study, the HF treatment is performed to a-Si: H nanoball. By the HFtreatment, the photoluminescence wavelength has shifted from about 740 nm to 590 nm. We have measured the diameter of Si nanocrystal using the X-Ray Diffraction (XRD) and the Transmission Electron Microscope (TEM). It is found that the diameter of the Si nanocrystal decreases from about 5.0 nm to 3.0 nm, by the HF treatment. After changing the conditions of oxidation, PL peak wavelengths are shifted from about 740 nni to 500 nm. We have determined the diameter of Si nanocrystal contained in the a-Si:H nanoball using XRD and TEM. Consequently, it is found that the diameter of Si nanocrystal becomes small from about 5.1 nm to 3.4 nm.

AB - Hydrogenated amorphous silicon (a-Si:H) nanoball films which include Si nanocrystals, are fabricated by the double-tubed coaxial-line-type microwave plasma chemical vapor deposition (DTCL-MPCVD) system. Photoluminescence (PL) is observed at room temperature after the a-Si:H nanoball films are oxidized at high temperature in air and/or pure oxygen atmosphere. In this study, the HF treatment is performed to a-Si: H nanoball. By the HFtreatment, the photoluminescence wavelength has shifted from about 740 nm to 590 nm. We have measured the diameter of Si nanocrystal using the X-Ray Diffraction (XRD) and the Transmission Electron Microscope (TEM). It is found that the diameter of the Si nanocrystal decreases from about 5.0 nm to 3.0 nm, by the HF treatment. After changing the conditions of oxidation, PL peak wavelengths are shifted from about 740 nni to 500 nm. We have determined the diameter of Si nanocrystal contained in the a-Si:H nanoball using XRD and TEM. Consequently, it is found that the diameter of Si nanocrystal becomes small from about 5.1 nm to 3.4 nm.

UR - http://www.scopus.com/inward/record.url?scp=34047125256&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34047125256&partnerID=8YFLogxK

U2 - 10.3131/jvsj.49.557

DO - 10.3131/jvsj.49.557

M3 - Article

AN - SCOPUS:34047125256

VL - 49

SP - 557

EP - 561

JO - Journal of the Vacuum Society of Japan

JF - Journal of the Vacuum Society of Japan

SN - 1882-2398

IS - 9

ER -