Bottom-up fabrication of high-k dielectric nanofilms using oxide nanosheets as a building block

Minoru Osada, Takayoshi Sasaki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present a novel fabrication procedure for high-k dielectric nanofilms by using of titania nanosheet as a building block. Layer-by-layer assembly of titania nanosheets with the use of the atomically flat SrRuO3 substrate is advantageous as a means of the fabrication for atomically uniform multilayer high-k nanofilms. High-resolution transmission electron microscopy revealed that these multilayer nanofilms are composed of the well-ordered lamellar structure corresponding to the layer-by-layer assembly, and the film-substrate interface is atomically flat without interfacial dead layer. These nanofilms exhibited both high dielectric constant (εr ∼125) and low leakage current density (J < 10-7 A/cm 2) even for thickness down to 10 nm. These results, as well as the simple, low-cost and low-temperature features of the layer-by-layer assembly, our approach provides a rational design and construction of high-k devices.

Original languageEnglish
Title of host publication5th IMAPS/ACerS International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies 2009, CICMT 2009
Pages131-136
Number of pages6
Publication statusPublished - 2009
Externally publishedYes
Event5th International Conference on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2009 - Denver, CO, United States
Duration: 2009 Apr 212009 Apr 23

Other

Other5th International Conference on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2009
CountryUnited States
CityDenver, CO
Period09/4/2109/4/23

Keywords

  • Bottom-up fabrication
  • High-k dielectrics
  • Layer-by-layer assembly
  • Oxide nanosheet

ASJC Scopus subject areas

  • Hardware and Architecture
  • Ceramics and Composites

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  • Cite this

    Osada, M., & Sasaki, T. (2009). Bottom-up fabrication of high-k dielectric nanofilms using oxide nanosheets as a building block. In 5th IMAPS/ACerS International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies 2009, CICMT 2009 (pp. 131-136)