Bunch length monitor using two-frequency analysis for rf gun system

Ryunosuke Kuroda, Shigeru Kashiwagi, Kazuyuki Sakaue, Masakazu Washio, Hitoshi Hayano, Junji Urakawa

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

An rms (root mean square) bunch length monitor for a laser-driven photocathode rf gun system based on a two-frequency analysis technique has been developed. Typically, the photoelectron beam generated from the rf gun system has an energy of 3-5 MeV and an rms bunch length smaller than 20 ps down to 3-4 ps. This monitor is suitable for such electron beam measurement. The rms bunch length as a function of rf phase was experimentally measured using both the rms bunch length monitor and streak camera technique using a 50 MeV electron beam at the KEK accelerator test facility (KEK-ATF) injector section which has an rf gun system and a 3-m-long accelerator structure. A numerical simulation study was also performed using the PARMELA code. The availability of this monitor was clearly verified by comparing the results. Consequently, this monitor was installed in the rf gun system at Waseda University and the rms bunch length measurement for a 3.5 MeV electron beam was precisely performed using the monitor.

Original languageEnglish
Pages (from-to)7747-7752
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number11 A
DOIs
Publication statusPublished - 2004 Nov

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monitors
Electron beams
Particle accelerators
Streak cameras
Photocathodes
electron beams
Photoelectrons
Test facilities
accelerators
Availability
streak cameras
Lasers
Computer simulation
photocathodes
test facilities
injectors
availability
photoelectrons
cameras
lasers

Keywords

  • Beam diagnostic
  • Beam spectrum
  • Bunch length measurement
  • Photoelectron beam
  • rf gun

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Bunch length monitor using two-frequency analysis for rf gun system. / Kuroda, Ryunosuke; Kashiwagi, Shigeru; Sakaue, Kazuyuki; Washio, Masakazu; Hayano, Hitoshi; Urakawa, Junji.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 43, No. 11 A, 11.2004, p. 7747-7752.

Research output: Contribution to journalArticle

Kuroda, Ryunosuke ; Kashiwagi, Shigeru ; Sakaue, Kazuyuki ; Washio, Masakazu ; Hayano, Hitoshi ; Urakawa, Junji. / Bunch length monitor using two-frequency analysis for rf gun system. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2004 ; Vol. 43, No. 11 A. pp. 7747-7752.
@article{5b1b037f3ea3474da65142a9c736dd2a,
title = "Bunch length monitor using two-frequency analysis for rf gun system",
abstract = "An rms (root mean square) bunch length monitor for a laser-driven photocathode rf gun system based on a two-frequency analysis technique has been developed. Typically, the photoelectron beam generated from the rf gun system has an energy of 3-5 MeV and an rms bunch length smaller than 20 ps down to 3-4 ps. This monitor is suitable for such electron beam measurement. The rms bunch length as a function of rf phase was experimentally measured using both the rms bunch length monitor and streak camera technique using a 50 MeV electron beam at the KEK accelerator test facility (KEK-ATF) injector section which has an rf gun system and a 3-m-long accelerator structure. A numerical simulation study was also performed using the PARMELA code. The availability of this monitor was clearly verified by comparing the results. Consequently, this monitor was installed in the rf gun system at Waseda University and the rms bunch length measurement for a 3.5 MeV electron beam was precisely performed using the monitor.",
keywords = "Beam diagnostic, Beam spectrum, Bunch length measurement, Photoelectron beam, rf gun",
author = "Ryunosuke Kuroda and Shigeru Kashiwagi and Kazuyuki Sakaue and Masakazu Washio and Hitoshi Hayano and Junji Urakawa",
year = "2004",
month = "11",
doi = "10.1143/JJAP.43.7747",
language = "English",
volume = "43",
pages = "7747--7752",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "11 A",

}

TY - JOUR

T1 - Bunch length monitor using two-frequency analysis for rf gun system

AU - Kuroda, Ryunosuke

AU - Kashiwagi, Shigeru

AU - Sakaue, Kazuyuki

AU - Washio, Masakazu

AU - Hayano, Hitoshi

AU - Urakawa, Junji

PY - 2004/11

Y1 - 2004/11

N2 - An rms (root mean square) bunch length monitor for a laser-driven photocathode rf gun system based on a two-frequency analysis technique has been developed. Typically, the photoelectron beam generated from the rf gun system has an energy of 3-5 MeV and an rms bunch length smaller than 20 ps down to 3-4 ps. This monitor is suitable for such electron beam measurement. The rms bunch length as a function of rf phase was experimentally measured using both the rms bunch length monitor and streak camera technique using a 50 MeV electron beam at the KEK accelerator test facility (KEK-ATF) injector section which has an rf gun system and a 3-m-long accelerator structure. A numerical simulation study was also performed using the PARMELA code. The availability of this monitor was clearly verified by comparing the results. Consequently, this monitor was installed in the rf gun system at Waseda University and the rms bunch length measurement for a 3.5 MeV electron beam was precisely performed using the monitor.

AB - An rms (root mean square) bunch length monitor for a laser-driven photocathode rf gun system based on a two-frequency analysis technique has been developed. Typically, the photoelectron beam generated from the rf gun system has an energy of 3-5 MeV and an rms bunch length smaller than 20 ps down to 3-4 ps. This monitor is suitable for such electron beam measurement. The rms bunch length as a function of rf phase was experimentally measured using both the rms bunch length monitor and streak camera technique using a 50 MeV electron beam at the KEK accelerator test facility (KEK-ATF) injector section which has an rf gun system and a 3-m-long accelerator structure. A numerical simulation study was also performed using the PARMELA code. The availability of this monitor was clearly verified by comparing the results. Consequently, this monitor was installed in the rf gun system at Waseda University and the rms bunch length measurement for a 3.5 MeV electron beam was precisely performed using the monitor.

KW - Beam diagnostic

KW - Beam spectrum

KW - Bunch length measurement

KW - Photoelectron beam

KW - rf gun

UR - http://www.scopus.com/inward/record.url?scp=11144238566&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=11144238566&partnerID=8YFLogxK

U2 - 10.1143/JJAP.43.7747

DO - 10.1143/JJAP.43.7747

M3 - Article

AN - SCOPUS:11144238566

VL - 43

SP - 7747

EP - 7752

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 11 A

ER -