Capacitance and yield evaluations using a 90-nm process technology based on the dense power-ground interconnect architecture

Atsushi Kurokawa, Masaharu Yamamoto, Nobuto Ono, Tetsuro Kage, Yasuaki Inoue, Hiroo Masuda

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Citations (Scopus)

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    Engineering & Materials Science