Change in surface morphology of polytetrafluoroethylene by reactive ion etching

Tomohiro Takahashi, Yuki Hirano, Yuya Takasawa, Tomoko Gowa, Naoyuki Fukutake, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

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14 Citations (Scopus)

Abstract

Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N2 and O2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N2 and O2 plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.

Original languageEnglish
Pages (from-to)253-256
Number of pages4
JournalRadiation Physics and Chemistry
Volume80
Issue number2
DOIs
Publication statusPublished - 2011 Feb 1

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Keywords

  • PTFE
  • Plasma
  • Reactive ion etching
  • Water repellency

ASJC Scopus subject areas

  • Radiation

Cite this

Takahashi, T., Hirano, Y., Takasawa, Y., Gowa, T., Fukutake, N., Oshima, A., Tagawa, S., & Washio, M. (2011). Change in surface morphology of polytetrafluoroethylene by reactive ion etching. Radiation Physics and Chemistry, 80(2), 253-256. https://doi.org/10.1016/j.radphyschem.2010.07.042