Change in surface morphology of polytetrafluoroethylene by reactive ion etching

Tomohiro Takahashi, Yuki Hirano, Yuya Takasawa, Tomoko Gowa, Naoyuki Fukutake, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

    Research output: Contribution to journalArticle

    13 Citations (Scopus)

    Abstract

    Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N2 and O2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N2 and O2 plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.

    Original languageEnglish
    Pages (from-to)253-256
    Number of pages4
    JournalRadiation Physics and Chemistry
    Volume80
    Issue number2
    DOIs
    Publication statusPublished - 2011 Feb

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    polytetrafluoroethylene
    etching
    ions
    needles
    water
    surface roughness
    fibers

    Keywords

    • Plasma
    • PTFE
    • Reactive ion etching
    • Water repellency

    ASJC Scopus subject areas

    • Radiation

    Cite this

    Change in surface morphology of polytetrafluoroethylene by reactive ion etching. / Takahashi, Tomohiro; Hirano, Yuki; Takasawa, Yuya; Gowa, Tomoko; Fukutake, Naoyuki; Oshima, Akihiro; Tagawa, Seiichi; Washio, Masakazu.

    In: Radiation Physics and Chemistry, Vol. 80, No. 2, 02.2011, p. 253-256.

    Research output: Contribution to journalArticle

    Takahashi, T, Hirano, Y, Takasawa, Y, Gowa, T, Fukutake, N, Oshima, A, Tagawa, S & Washio, M 2011, 'Change in surface morphology of polytetrafluoroethylene by reactive ion etching', Radiation Physics and Chemistry, vol. 80, no. 2, pp. 253-256. https://doi.org/10.1016/j.radphyschem.2010.07.042
    Takahashi, Tomohiro ; Hirano, Yuki ; Takasawa, Yuya ; Gowa, Tomoko ; Fukutake, Naoyuki ; Oshima, Akihiro ; Tagawa, Seiichi ; Washio, Masakazu. / Change in surface morphology of polytetrafluoroethylene by reactive ion etching. In: Radiation Physics and Chemistry. 2011 ; Vol. 80, No. 2. pp. 253-256.
    @article{e30995c60f8245a581025d0eee0e336c,
    title = "Change in surface morphology of polytetrafluoroethylene by reactive ion etching",
    abstract = "Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N2 and O2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N2 and O2 plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.",
    keywords = "Plasma, PTFE, Reactive ion etching, Water repellency",
    author = "Tomohiro Takahashi and Yuki Hirano and Yuya Takasawa and Tomoko Gowa and Naoyuki Fukutake and Akihiro Oshima and Seiichi Tagawa and Masakazu Washio",
    year = "2011",
    month = "2",
    doi = "10.1016/j.radphyschem.2010.07.042",
    language = "English",
    volume = "80",
    pages = "253--256",
    journal = "Radiation Physics and Chemistry",
    issn = "0969-806X",
    publisher = "Elsevier Limited",
    number = "2",

    }

    TY - JOUR

    T1 - Change in surface morphology of polytetrafluoroethylene by reactive ion etching

    AU - Takahashi, Tomohiro

    AU - Hirano, Yuki

    AU - Takasawa, Yuya

    AU - Gowa, Tomoko

    AU - Fukutake, Naoyuki

    AU - Oshima, Akihiro

    AU - Tagawa, Seiichi

    AU - Washio, Masakazu

    PY - 2011/2

    Y1 - 2011/2

    N2 - Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N2 and O2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N2 and O2 plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.

    AB - Polytetrafluoroethylene (PTFE) was exposed to Ar, CF4, N2 and O2 plasmas using a reactive ion etching facility. After the exposure, the change in the surface morphology of PTFE was examined and characterization studies were performed for the etching rate, surface roughness, radical yields, chemical structures, water repellency and so on. The etching rates of Ar, CF4, N2 and O2 plasmas were 0.58, 7.2, 4.4 and 17γm/h, respectively. It was observed that needle-like nano-fiber structures on the surface were irregularly fabricated by the CF4 plasma. In addition, when the water repellency of exposed samples was evaluated by contact angle, they showed super-hydrophobic properties: contact angle over 150°.

    KW - Plasma

    KW - PTFE

    KW - Reactive ion etching

    KW - Water repellency

    UR - http://www.scopus.com/inward/record.url?scp=78649329794&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=78649329794&partnerID=8YFLogxK

    U2 - 10.1016/j.radphyschem.2010.07.042

    DO - 10.1016/j.radphyschem.2010.07.042

    M3 - Article

    VL - 80

    SP - 253

    EP - 256

    JO - Radiation Physics and Chemistry

    JF - Radiation Physics and Chemistry

    SN - 0969-806X

    IS - 2

    ER -