TY - GEN
T1 - Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss
AU - Takano, Kyoya
AU - Amakawa, Shuhei
AU - Katayama, Kosuke
AU - Motoyoshi, Mizuki
AU - Fujishima, Minoru
PY - 2012/10/29
Y1 - 2012/10/29
N2 - A characteristic impedance determination technique that can be used in the CMOS process with a large substrate loss is proposed. Furthermore, it is shown using image parameters that the propagation constant is obtained directly from Thru and Line without determining error networks. The validity of the characteristic impedance obtained by the proposed method is shown using the measurement and EM simulation results. The calibration patterns used for the validation check were fabricated using the 40 nm CMOS process.
AB - A characteristic impedance determination technique that can be used in the CMOS process with a large substrate loss is proposed. Furthermore, it is shown using image parameters that the propagation constant is obtained directly from Thru and Line without determining error networks. The validity of the characteristic impedance obtained by the proposed method is shown using the measurement and EM simulation results. The calibration patterns used for the validation check were fabricated using the 40 nm CMOS process.
KW - CMOS
KW - characteristic impedance
KW - distributed constant circuit model
KW - on-wafer measurement
KW - transmission line
UR - http://www.scopus.com/inward/record.url?scp=84867830246&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84867830246&partnerID=8YFLogxK
U2 - 10.1109/ARFTG79.2012.6291203
DO - 10.1109/ARFTG79.2012.6291203
M3 - Conference contribution
AN - SCOPUS:84867830246
SN - 9781467312301
T3 - 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012
BT - 79th ARFTG Microwave Measurement Conference
T2 - 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012
Y2 - 22 June 2012 through 22 June 2012
ER -