Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss

Kyoya Takano; Shuhei Amakawa; Kosuke Katayama; Mizuki Motoyoshi; Minoru Fujishima

doi:10.1109/ARFTG79.2012.6291203

Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss

Kyoya Takano, Shuhei Amakawa, Kosuke Katayama, Mizuki Motoyoshi, Minoru Fujishima

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

8 Citations (Scopus)

Abstract

A characteristic impedance determination technique that can be used in the CMOS process with a large substrate loss is proposed. Furthermore, it is shown using image parameters that the propagation constant is obtained directly from Thru and Line without determining error networks. The validity of the characteristic impedance obtained by the proposed method is shown using the measurement and EM simulation results. The calibration patterns used for the validation check were fabricated using the 40 nm CMOS process.

Original language	English
Title of host publication	79th ARFTG Microwave Measurement Conference
Subtitle of host publication	Non-Linear Measurement Systems, ARFTG 2012
DOIs	https://doi.org/10.1109/ARFTG79.2012.6291203
Publication status	Published - 2012 Oct 29
Externally published	Yes
Event	79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012 - Montreal, QC, Canada Duration: 2012 Jun 22 → 2012 Jun 22

Publication series

Name	79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012

Other

Other	79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012
Country	Canada
City	Montreal, QC
Period	12/6/22 → 12/6/22

Keywords

CMOS
characteristic impedance
distributed constant circuit model
on-wafer measurement
transmission line

ASJC Scopus subject areas

Electrical and Electronic Engineering

Access to Document

10.1109/ARFTG79.2012.6291203

Fingerprint Dive into the research topics of 'Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss'. Together they form a unique fingerprint.

Cite this

Takano, K., Amakawa, S., Katayama, K., Motoyoshi, M., & Fujishima, M. (2012). Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss. In 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012 [6291203] (79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012). https://doi.org/10.1109/ARFTG79.2012.6291203

Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss. / Takano, Kyoya; Amakawa, Shuhei; Katayama, Kosuke; Motoyoshi, Mizuki; Fujishima, Minoru.

79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012. 2012. 6291203 (79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Takano, K, Amakawa, S, Katayama, K, Motoyoshi, M & Fujishima, M 2012, Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss. in 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012., 6291203, 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012, 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012, Montreal, QC, Canada, 12/6/22. https://doi.org/10.1109/ARFTG79.2012.6291203

Takano K, Amakawa S, Katayama K, Motoyoshi M, Fujishima M. Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss. In 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012. 2012. 6291203. (79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012). https://doi.org/10.1109/ARFTG79.2012.6291203

Takano, Kyoya ; Amakawa, Shuhei ; Katayama, Kosuke ; Motoyoshi, Mizuki ; Fujishima, Minoru. / Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss. 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012. 2012. (79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012).

@inproceedings{0fa4f35c8b8e414b8c6ff37e431079c2,

title = "Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss",

abstract = "A characteristic impedance determination technique that can be used in the CMOS process with a large substrate loss is proposed. Furthermore, it is shown using image parameters that the propagation constant is obtained directly from Thru and Line without determining error networks. The validity of the characteristic impedance obtained by the proposed method is shown using the measurement and EM simulation results. The calibration patterns used for the validation check were fabricated using the 40 nm CMOS process.",

keywords = "CMOS, characteristic impedance, distributed constant circuit model, on-wafer measurement, transmission line",

author = "Kyoya Takano and Shuhei Amakawa and Kosuke Katayama and Mizuki Motoyoshi and Minoru Fujishima",

year = "2012",

month = oct,

day = "29",

doi = "10.1109/ARFTG79.2012.6291203",

language = "English",

isbn = "9781467312301",

series = "79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012",

booktitle = "79th ARFTG Microwave Measurement Conference",

note = "79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012 ; Conference date: 22-06-2012 Through 22-06-2012",

}

TY - GEN

T1 - Characteristic impedance determination technique for CMOS on-wafer transmission line with large substrate loss

AU - Takano, Kyoya

AU - Amakawa, Shuhei

AU - Katayama, Kosuke

AU - Motoyoshi, Mizuki

AU - Fujishima, Minoru

PY - 2012/10/29

Y1 - 2012/10/29

N2 - A characteristic impedance determination technique that can be used in the CMOS process with a large substrate loss is proposed. Furthermore, it is shown using image parameters that the propagation constant is obtained directly from Thru and Line without determining error networks. The validity of the characteristic impedance obtained by the proposed method is shown using the measurement and EM simulation results. The calibration patterns used for the validation check were fabricated using the 40 nm CMOS process.

AB - A characteristic impedance determination technique that can be used in the CMOS process with a large substrate loss is proposed. Furthermore, it is shown using image parameters that the propagation constant is obtained directly from Thru and Line without determining error networks. The validity of the characteristic impedance obtained by the proposed method is shown using the measurement and EM simulation results. The calibration patterns used for the validation check were fabricated using the 40 nm CMOS process.

KW - CMOS

KW - characteristic impedance

KW - distributed constant circuit model

KW - on-wafer measurement

KW - transmission line

UR - http://www.scopus.com/inward/record.url?scp=84867830246&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84867830246&partnerID=8YFLogxK

U2 - 10.1109/ARFTG79.2012.6291203

DO - 10.1109/ARFTG79.2012.6291203

M3 - Conference contribution

AN - SCOPUS:84867830246

SN - 9781467312301

T3 - 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012

BT - 79th ARFTG Microwave Measurement Conference

T2 - 79th ARFTG Microwave Measurement Conference: Non-Linear Measurement Systems, ARFTG 2012

Y2 - 22 June 2012 through 22 June 2012

ER -