Characteristics of altered layers formed by sputtering with a massive molecular ion containing diverse elements with large mass differences

Yukio Fujiwara, Kouji Kondou, Hidehiko Nonaka, Naoaki Saito, Toshiyuki Fujimoto, Akira Kurokawa, Shingo Ichimura, Mitsuhiro Tomita

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Tetrairidium dodecacarbonyl (Ir4 (CO)12) is an organometallic compound called metal cluster complex which has a molecular weight of 1104.9. To investigate its irradiation effect, silicon substrates sputtered with 10 keV Ir4 (CO) 7+ were analyzed by high resolution Rutherford backscattering spectrometry. Experimental results were examined on the basis of a conventional theory of simultaneous implantation and sputtering. The introduction of oxygen gas during sputtering proved to form a thick oxide layer in the substrate, resulting in iridium segregation at the silicon-oxide interface and carbon accumulation near the surface. It was confirmed that oxygen partial pressure significantly affected the characteristics of an altered layer beneath a sputtered surface.

Original languageEnglish
Article number073509
JournalJournal of Applied Physics
Volume102
Issue number7
DOIs
Publication statusPublished - 2007 Oct 22
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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