Characterization of a-Si: H/SiN multilayer waveguide polarization using an optical pumping application-LED

This paper describes the fabrication of a waveguide and the analysis of its polarization characteristics by applying light-emitting diode (LED) pumping lights to its surface. By using double tubed coaxial line (DTCL) microwave plasma chemical vapor deposition (MPCVD) equipment, an a-Si:H/SiN multilayer waveguide was fabricated whose thickness could be controlled at nanometer order. The main structural material of the waveguide sample consisted of a combination of layers of amorphous silicon hydrogen and silicon nitrate. Once the sample was ready, another major objective of the experiment was to analyze the polarization characteristics of the fabricated waveguide. The idea of the experiment was to analyze how the waveguide reacts when three types of LED (blue, yellow, and red) are radiated onto its surface. The results showed that the fabrication of the a-Si:H/SiN sample is successful. Most effective transmission results, which accord with the polarization characteristics analysis, were obtained.