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Characterization of chemically-deposited NiB and NiWB thin films as a capping layer for ULSI application
Tetsuya Osaka*, Nao Takano, Tetsuya Kurokawa, Tomomi Kaneko, Kazuyoshi Ueno
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
53
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(Scopus)