Characterization of diamond particles and films formed by plasma-assisted chemical vapour deposition using high-voltage electron microscopy

Hiroshi Kawarada, King Sheng Mar, Junichi Suzuki, Toshimichi Ito, Hirotaro Mori, Hiroshi Fujita, Akio Hiraki

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

The internal and interfacial structures of diamond particles and films on Si substrates formed by plasma-assisted chemical vapour deposition have been investigated by high-voltage transmission electron microscopy. The feature of line defects–micro-twin lamellae or stacking faults–in a diamond particle indicates the concentric crystal growth originated from one nucleus. The particles are observed to be in direct contact with the Si substrate around the nucleation site within the resolution limit. The particles are stacked up to form a diamond film.

Original languageEnglish
Pages (from-to)L1903-L1906
JournalJapanese journal of applied physics
Volume26
Issue number11 A
DOIs
Publication statusPublished - 1987 Nov
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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