TY - JOUR
T1 - Characterization of diamond particles and films formed by plasma-assisted chemical vapour deposition using high-voltage electron microscopy
AU - Kawarada, Hiroshi
AU - Mar, King Sheng
AU - Suzuki, Junichi
AU - Ito, Toshimichi
AU - Mori, Hirotaro
AU - Fujita, Hiroshi
AU - Hiraki, Akio
PY - 1987/11
Y1 - 1987/11
N2 - The internal and interfacial structures of diamond particles and films on Si substrates formed by plasma-assisted chemical vapour deposition have been investigated by high-voltage transmission electron microscopy. The feature of line defects–micro-twin lamellae or stacking faults–in a diamond particle indicates the concentric crystal growth originated from one nucleus. The particles are observed to be in direct contact with the Si substrate around the nucleation site within the resolution limit. The particles are stacked up to form a diamond film.
AB - The internal and interfacial structures of diamond particles and films on Si substrates formed by plasma-assisted chemical vapour deposition have been investigated by high-voltage transmission electron microscopy. The feature of line defects–micro-twin lamellae or stacking faults–in a diamond particle indicates the concentric crystal growth originated from one nucleus. The particles are observed to be in direct contact with the Si substrate around the nucleation site within the resolution limit. The particles are stacked up to form a diamond film.
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U2 - 10.1143/JJAP.26.L1903
DO - 10.1143/JJAP.26.L1903
M3 - Article
AN - SCOPUS:84951198177
SN - 0021-4922
VL - 26
SP - L1903-L1906
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 11 A
ER -