Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy

T. Souno, H. Nishikawa, M. Hattori, Yoshimichi Ohki, E. Watanabe, M. Oikawa, T. Kamiya, K. Arakawa

    Research output: Contribution to journalArticle

    7 Citations (Scopus)

    Abstract

    We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 1017 cm -2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm-1 peak associated with compaction at the microbeam irradiated regions.

    Original languageEnglish
    Pages (from-to)277-280
    Number of pages4
    JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Volume210
    DOIs
    Publication statusPublished - 2003 Sep

    Fingerprint

    Photoluminescence spectroscopy
    silica glass
    Fused silica
    Raman spectroscopy
    Photoluminescence
    microbeams
    Ions
    photoluminescence
    spectroscopy
    ions
    Silicon Dioxide
    Raman scattering
    Refractive index
    Silica
    refractivity
    Raman spectra
    silicon dioxide
    fluence
    Compaction
    Substrates

    Keywords

    • Ion microbeam
    • Photoluminescence
    • Raman scattering
    • Silica

    ASJC Scopus subject areas

    • Surfaces, Coatings and Films
    • Instrumentation
    • Surfaces and Interfaces

    Cite this

    Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy. / Souno, T.; Nishikawa, H.; Hattori, M.; Ohki, Yoshimichi; Watanabe, E.; Oikawa, M.; Kamiya, T.; Arakawa, K.

    In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 210, 09.2003, p. 277-280.

    Research output: Contribution to journalArticle

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    AU - Souno, T.

    AU - Nishikawa, H.

    AU - Hattori, M.

    AU - Ohki, Yoshimichi

    AU - Watanabe, E.

    AU - Oikawa, M.

    AU - Kamiya, T.

    AU - Arakawa, K.

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    AB - We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 1017 cm -2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm-1 peak associated with compaction at the microbeam irradiated regions.

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    KW - Photoluminescence

    KW - Raman scattering

    KW - Silica

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