Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy

T. Souno; H. Nishikawa; M. Hattori; Y. Ohki; E. Watanabe; M. Oikawa; T. Kamiya; K. Arakawa

doi:10.1016/S0168-583X(03)01032-2

Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy

T. Souno, H. Nishikawa^*, M. Hattori, Y. Ohki, E. Watanabe, M. Oikawa, T. Kamiya, K. Arakawa

^*Corresponding author for this work

Kagami Memorial Research Institute for Materials Science and Technology

Research output: Contribution to journal › Conference article › peer-review

7 Citations (Scopus)

Abstract

We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H⁺) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 10¹⁷ cm ^-2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm^-1 peak associated with compaction at the microbeam irradiated regions.

Original language	English
Pages (from-to)	277-280
Number of pages	4
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	210
DOIs	https://doi.org/10.1016/S0168-583X(03)01032-2
Publication status	Published - 2003 Sept
Event	8th International Conference on Nuclear Microprobe Technology - Takasaki, Japan Duration: 2002 Sept 8 → 2002 Sept 13

Keywords

Ion microbeam
Photoluminescence
Raman scattering
Silica

ASJC Scopus subject areas

Nuclear and High Energy Physics
Instrumentation

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10.1016/S0168-583X(03)01032-2

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Souno, T., Nishikawa, H., Hattori, M., Ohki, Y., Watanabe, E., Oikawa, M., Kamiya, T., & Arakawa, K. (2003). Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 210, 277-280. https://doi.org/10.1016/S0168-583X(03)01032-2

Souno, T, Nishikawa, H, Hattori, M, Ohki, Y, Watanabe, E, Oikawa, M, Kamiya, T & Arakawa, K 2003, 'Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 210, pp. 277-280. https://doi.org/10.1016/S0168-583X(03)01032-2

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title = "Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy",

abstract = "We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 1017 cm -2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm-1 peak associated with compaction at the microbeam irradiated regions.",

keywords = "Ion microbeam, Photoluminescence, Raman scattering, Silica",

author = "T. Souno and H. Nishikawa and M. Hattori and Y. Ohki and E. Watanabe and M. Oikawa and T. Kamiya and K. Arakawa",

year = "2003",

month = sep,

doi = "10.1016/S0168-583X(03)01032-2",

language = "English",

volume = "210",

pages = "277--280",

journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",

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note = "8th International Conference on Nuclear Microprobe Technology ; Conference date: 08-09-2002 Through 13-09-2002",

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TY - JOUR

T1 - Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy

AU - Souno, T.

AU - Nishikawa, H.

AU - Hattori, M.

AU - Ohki, Y.

AU - Watanabe, E.

AU - Oikawa, M.

AU - Kamiya, T.

AU - Arakawa, K.

PY - 2003/9

Y1 - 2003/9

N2 - We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 1017 cm -2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm-1 peak associated with compaction at the microbeam irradiated regions.

AB - We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of 1 × 1017 cm -2, then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm-1 peak associated with compaction at the microbeam irradiated regions.

KW - Ion microbeam

KW - Photoluminescence

KW - Raman scattering

KW - Silica

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U2 - 10.1016/S0168-583X(03)01032-2

DO - 10.1016/S0168-583X(03)01032-2

M3 - Conference article

AN - SCOPUS:0043014863

SN - 0168-583X

VL - 210

SP - 277

EP - 280

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

T2 - 8th International Conference on Nuclear Microprobe Technology

Y2 - 8 September 2002 through 13 September 2002

ER -

Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy

Abstract

Keywords

ASJC Scopus subject areas

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