Characterization of roughness and defects at an Si/SiO2 interface formed by lateral solid phase epitaxy using high-resolution electron microscopy

Hiroshi Kawarada*, Tomo Ueno, Iwao Ohdomari, Yasuo Kunii

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

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Physics & Astronomy