Co-based soft magnetic films produced by electroless deposition

Tetsuya Osaka, Takayuki Homma, K. Saito, A. Takekoshi, Y. Yamazaki, T. Namikawa

Research output: Contribution to journalArticle

35 Citations (Scopus)

Abstract

On the basis of our work on electroless CoB soft magnetic films with high saturation magnetization (Ms) and low coercivity (Hc) the effects of applying an external field during deposition and of adding Fe to the CoB binary system were investigated in order to improve the soft magnetic properties. When an external field (560 G) is applied, the Hc of deposited CoB films decreases from 1.20 Oe to 0.64 Oe. In the case of CoFeB ternary alloy films, FeSO4 is added to the CoB bath and its concentration is varied from 0.001 to 0.05 mol dm-3. The best soft magnetic properties, Hc = 0.72 Oe and Ms = 1180 emu cc-1, are obtained when the film is deposited from the bath containing 0.0025 mol dm-3 of FeSO4. The film had a small magnetostriction value (-4.4×10$+-7) and higher permeability. The results of structural analysis suggest that the film consists of fine-particulated hexagonal close-packed crystallite with high crystallinity.

Original languageEnglish
Pages (from-to)1311-1314
Number of pages4
JournalJournal of the Electrochemical Society
Volume139
Issue number5
Publication statusPublished - 1992 May

Fingerprint

Magnetic films
electroless deposition
Electroless plating
magnetic films
baths
Magnetic properties
magnetic properties
Magnetostriction
Ternary alloys
ternary alloys
Saturation magnetization
magnetostriction
Coercive force
structural analysis
Structural analysis
coercivity
crystallinity
permeability
saturation
magnetization

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Osaka, T., Homma, T., Saito, K., Takekoshi, A., Yamazaki, Y., & Namikawa, T. (1992). Co-based soft magnetic films produced by electroless deposition. Journal of the Electrochemical Society, 139(5), 1311-1314.

Co-based soft magnetic films produced by electroless deposition. / Osaka, Tetsuya; Homma, Takayuki; Saito, K.; Takekoshi, A.; Yamazaki, Y.; Namikawa, T.

In: Journal of the Electrochemical Society, Vol. 139, No. 5, 05.1992, p. 1311-1314.

Research output: Contribution to journalArticle

Osaka, T, Homma, T, Saito, K, Takekoshi, A, Yamazaki, Y & Namikawa, T 1992, 'Co-based soft magnetic films produced by electroless deposition', Journal of the Electrochemical Society, vol. 139, no. 5, pp. 1311-1314.
Osaka T, Homma T, Saito K, Takekoshi A, Yamazaki Y, Namikawa T. Co-based soft magnetic films produced by electroless deposition. Journal of the Electrochemical Society. 1992 May;139(5):1311-1314.
Osaka, Tetsuya ; Homma, Takayuki ; Saito, K. ; Takekoshi, A. ; Yamazaki, Y. ; Namikawa, T. / Co-based soft magnetic films produced by electroless deposition. In: Journal of the Electrochemical Society. 1992 ; Vol. 139, No. 5. pp. 1311-1314.
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