Co–Based Soft Magnetic Films Produced by Electroless Deposition

T. Osaka, T. Homma, K. Saito, A. Takekoshi, Y. Yamazaki, T. Namikawa

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Abstract

On the basis of our work on electroless CoB soft magnetic films with high saturation magnetization (Ms) and low coercivity (He) the effects of applying an external field during deposition and of adding Fe to the CoB binary system were investigated in order to improve the soft magnetic properties. When an external field (560 G) is applied, the He of deposited CoB films decreases from 1.20 Oe to 0.64 Oe. In the case of CoFeB ternary alloy films, FeSO4 is added to the CoB bath and its concentration is varied from 0.001 to 0.05 mol dm–3. The best soft magnetic properties, He = 0.72 Oe and Ms = 1180 emu cc, are obtained when the film is deposited from the bath containing 0.0025 mol dm3 of FeSO4. The film had a small magnetostriction value (–4.4 x 10 7) and higher permeability. The results of structural analysis suggest that the film consists of fine–particulated hexagonal close–packed crystallite with high crystallinity.

Original languageEnglish
Pages (from-to)1311-1314
Number of pages4
JournalJournal of the Electrochemical Society
Volume139
Issue number5
DOIs
Publication statusPublished - 1992 May

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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