Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO2 laser pulse

S. Kashiwagi, R. Kato, G. Isoyama, R. Kuroda, J. Urakawa, Kazuyuki Sakaue, A. Masuda, T. Nomoto, T. Gowa, Masakazu Washio

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

High-power extreme ultra-violet (EUV) sources are required for next generation semiconductor lithography. We start developing a compact EUV source in the spectral range of 13-14 nm, which is based on laser Compton scattering between a 7 MeV micro-bucnhed electron beam and a high intensity CO2 laser pulse. The electron beam extracted from a DC photocathode gun is micro-bunched using laser modulation techinque with the Compton wavelength at a harmonic of the seeding laser [1] before the main laser Compton scattering for EUV radiation. A considerating scheme for the compact EUV source based on laser Compton scattering with micro-bunched electron beam and the anaritical study of micro-bunch generation are described in this papar. A plan of test experiment generating micro-bunched electron beam will be also introduced in this conference.

Original languageEnglish
Title of host publicationEPAC 2008 - Contributions to the Proceedings
PublisherEuropean Physical Society Accelerator Group (EPS-AG)
Pages1869-1871
Number of pages3
Publication statusPublished - 2008
Event11th European Particle Accelerator Conference, EPAC 2008 - Genoa
Duration: 2008 Jun 232008 Jun 27

Other

Other11th European Particle Accelerator Conference, EPAC 2008
CityGenoa
Period08/6/2308/6/27

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electron beams
pulses
scattering
lasers
extreme ultraviolet radiation
photocathodes
inoculation
high power lasers
lithography
direct current
harmonics
modulation
wavelengths

ASJC Scopus subject areas

  • Nuclear and High Energy Physics

Cite this

Kashiwagi, S., Kato, R., Isoyama, G., Kuroda, R., Urakawa, J., Sakaue, K., ... Washio, M. (2008). Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO2 laser pulse. In EPAC 2008 - Contributions to the Proceedings (pp. 1869-1871). European Physical Society Accelerator Group (EPS-AG).

Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO2 laser pulse. / Kashiwagi, S.; Kato, R.; Isoyama, G.; Kuroda, R.; Urakawa, J.; Sakaue, Kazuyuki; Masuda, A.; Nomoto, T.; Gowa, T.; Washio, Masakazu.

EPAC 2008 - Contributions to the Proceedings. European Physical Society Accelerator Group (EPS-AG), 2008. p. 1869-1871.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kashiwagi, S, Kato, R, Isoyama, G, Kuroda, R, Urakawa, J, Sakaue, K, Masuda, A, Nomoto, T, Gowa, T & Washio, M 2008, Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO2 laser pulse. in EPAC 2008 - Contributions to the Proceedings. European Physical Society Accelerator Group (EPS-AG), pp. 1869-1871, 11th European Particle Accelerator Conference, EPAC 2008, Genoa, 08/6/23.
Kashiwagi S, Kato R, Isoyama G, Kuroda R, Urakawa J, Sakaue K et al. Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO2 laser pulse. In EPAC 2008 - Contributions to the Proceedings. European Physical Society Accelerator Group (EPS-AG). 2008. p. 1869-1871
Kashiwagi, S. ; Kato, R. ; Isoyama, G. ; Kuroda, R. ; Urakawa, J. ; Sakaue, Kazuyuki ; Masuda, A. ; Nomoto, T. ; Gowa, T. ; Washio, Masakazu. / Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO2 laser pulse. EPAC 2008 - Contributions to the Proceedings. European Physical Society Accelerator Group (EPS-AG), 2008. pp. 1869-1871
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