Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO2 laser pulse

S. Kashiwagi, R. Kato, G. Isoyama, R. Kuroda, J. Urakawa, K. Sakaue, A. Masuda, T. Nomoto, T. Gowa, M. Washio

Research output: Contribution to conferencePaper

Abstract

High-power extreme ultra-violet (EUV) sources are required for next generation semiconductor lithography. We start developing a compact EUV source in the spectral range of 13-14 nm, which is based on laser Compton scattering between a 7 MeV micro-bucnhed electron beam and a high intensity CO2 laser pulse. The electron beam extracted from a DC photocathode gun is micro-bunched using laser modulation techinque with the Compton wavelength at a harmonic of the seeding laser [1] before the main laser Compton scattering for EUV radiation. A considerating scheme for the compact EUV source based on laser Compton scattering with micro-bunched electron beam and the anaritical study of micro-bunch generation are described in this papar. A plan of test experiment generating micro-bunched electron beam will be also introduced in this conference.

Original languageEnglish
Pages1869-1871
Number of pages3
Publication statusPublished - 2008
Event11th European Particle Accelerator Conference, EPAC 2008 - Genoa, Italy
Duration: 2008 Jun 232008 Jun 27

Conference

Conference11th European Particle Accelerator Conference, EPAC 2008
CountryItaly
CityGenoa
Period08/6/2308/6/27

ASJC Scopus subject areas

  • Nuclear and High Energy Physics

Fingerprint Dive into the research topics of 'Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO<sub>2</sub> laser pulse'. Together they form a unique fingerprint.

  • Cite this

    Kashiwagi, S., Kato, R., Isoyama, G., Kuroda, R., Urakawa, J., Sakaue, K., Masuda, A., Nomoto, T., Gowa, T., & Washio, M. (2008). Compact EUV source based on laser compton scattering between micro-bunch electron beam and CO2 laser pulse. 1869-1871. Paper presented at 11th European Particle Accelerator Conference, EPAC 2008, Genoa, Italy.