Comparative study of sputter-deposited SnO2 films doped with antimony or tantalum

Mirko Weidner, Junjun Jia, Yuzo Shigesato, Andreas Klein

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

SnO2 films doped with antimony or tantalum were sputter-deposited for comparison, using an identical set of parameters. The influence of dopant concentration and choice of deposition parameters such as substrate temperature on the optoelectronic properties, especially film resistivity, were determined. Comparative analysis shows that tantalum doping yields lower film resistivity, probably due to an increased inhibiting influence of grain boundary scattering in the case of antimony doping. Sputter-deposited tantalum-doped films with lower than previously achieved resistivity 5.4×10-4 Ωcm, carrier density 4.5×1020 cm-3, and mobility 25.7cm2Vs-1 are reported, while maintaining optical transmittance above 85% at a film thickness 400 nm. Ta/Sb co-doped thin films were synthesized for the first time, achieving similar results. Comparison of resistivity values achievable by doping sputter-deposited tin oxide films with antimony (blue) or tantalum (red) as a function of dopant concentration.

Original languageEnglish
Pages (from-to)923-928
Number of pages6
JournalPhysica Status Solidi (B) Basic Research
Volume253
Issue number5
DOIs
Publication statusPublished - 2016 May 1
Externally publishedYes

Fingerprint

Tantalum
Antimony
tantalum
antimony
Doping (additives)
electrical resistivity
tin oxides
Opacity
oxide films
transmittance
Tin oxides
film thickness
grain boundaries
Optoelectronic devices
Oxide films
Carrier concentration
Film thickness
Grain boundaries
Scattering
thin films

Keywords

  • Antimony
  • Doping
  • Films
  • Resistivity
  • SnO
  • Sputter deposition
  • Tantalum
  • Transparent conducting oxides

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Comparative study of sputter-deposited SnO2 films doped with antimony or tantalum. / Weidner, Mirko; Jia, Junjun; Shigesato, Yuzo; Klein, Andreas.

In: Physica Status Solidi (B) Basic Research, Vol. 253, No. 5, 01.05.2016, p. 923-928.

Research output: Contribution to journalArticle

Weidner, Mirko ; Jia, Junjun ; Shigesato, Yuzo ; Klein, Andreas. / Comparative study of sputter-deposited SnO2 films doped with antimony or tantalum. In: Physica Status Solidi (B) Basic Research. 2016 ; Vol. 253, No. 5. pp. 923-928.
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