Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition

Masayuki Kamei, Takahira Miyagi, Tomoyuki Ogawa, Takefumi Mitsuhashi, Atsushi Yamazaki, Tetsuya Sato

    Research output: Contribution to journalArticle

    5 Citations (Scopus)

    Abstract

    Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.

    Original languageEnglish
    Pages (from-to)7025-7028
    Number of pages4
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Volume42
    Issue number11
    Publication statusPublished - 2003 Nov

    Fingerprint

    Epitaxial films
    Metallorganic chemical vapor deposition
    anatase
    Magnetron sputtering
    Titanium dioxide
    metalorganic chemical vapor deposition
    magnetron sputtering
    Thin films
    thin films
    direct current
    Lattice constants
    Photoluminescence
    photoluminescence
    Dislocations (crystals)
    Excitons
    trapping
    excitons
    Crystalline materials
    Substrates
    profiles

    Keywords

    • CVD
    • Epitaxy
    • Rutherford backscattering spectroscopy
    • Sputtering
    • Titanium oxide

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition. / Kamei, Masayuki; Miyagi, Takahira; Ogawa, Tomoyuki; Mitsuhashi, Takefumi; Yamazaki, Atsushi; Sato, Tetsuya.

    In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 42, No. 11, 11.2003, p. 7025-7028.

    Research output: Contribution to journalArticle

    @article{d4e30695ed43412bab04a2ce65d92079,
    title = "Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition",
    abstract = "Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.",
    keywords = "CVD, Epitaxy, Rutherford backscattering spectroscopy, Sputtering, Titanium oxide",
    author = "Masayuki Kamei and Takahira Miyagi and Tomoyuki Ogawa and Takefumi Mitsuhashi and Atsushi Yamazaki and Tetsuya Sato",
    year = "2003",
    month = "11",
    language = "English",
    volume = "42",
    pages = "7025--7028",
    journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
    issn = "0021-4922",
    publisher = "Japan Society of Applied Physics",
    number = "11",

    }

    TY - JOUR

    T1 - Comparative Study of TiO2 Anatase Epitaxial Thin Films Grown by Magnetron Sputtering and Metalorganic Chemical Vapor Deposition

    AU - Kamei, Masayuki

    AU - Miyagi, Takahira

    AU - Ogawa, Tomoyuki

    AU - Mitsuhashi, Takefumi

    AU - Yamazaki, Atsushi

    AU - Sato, Tetsuya

    PY - 2003/11

    Y1 - 2003/11

    N2 - Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.

    AB - Thin films of TiO2 anatase structure were heteroepitaxially grown on SrTiO3(001) single crystalline substrates by direct current magnetron sputtering (DCSP) and metalorganic chemical vapor deposition (MOCVD). The DCSP-grown films always showed larger lattice constants than those of the MOCVD-grown films. The RBS measurements revealed a difference in the depth profiles of the misfit dislocations in the films, which was considered to be the origin of the larger lattice constants in the DCSP-grown films. A striking difference was also present in the photoluminescence characteristics in MOCVD-grown films and DCSP-grown films; the photoluminescence peak originating from the self- trapping excitons observed in MOCVD-films disappeared in DCSP-films.

    KW - CVD

    KW - Epitaxy

    KW - Rutherford backscattering spectroscopy

    KW - Sputtering

    KW - Titanium oxide

    UR - http://www.scopus.com/inward/record.url?scp=1642577038&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=1642577038&partnerID=8YFLogxK

    M3 - Article

    VL - 42

    SP - 7025

    EP - 7028

    JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

    JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

    SN - 0021-4922

    IS - 11

    ER -