Abstract
Vacuum electrospray of a quaternary ammonium ionic liquid, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium bis(trifluoromethanesulfonyl) amide (DEME-TFSA), was investigated to develop a primary ion source for secondary ion mass spectrometry (SIMS). Since the ionic liquid contains many methyl and ethyl groups as well as protons, its beam is expected to efficiently produce protonated molecules for SIMS analysis of organic materials. Experimental results showed that the beam consisted of charged particles of m/z about 1000 and charged droplets of m/z 10 5. The current components of both the charged particles and droplets changed with the applied voltage and the flow rate of the ionic liquid. With decreasing flow rate, the current component of the charged droplets increased, whereas that of the charged particles decreased. The m/z values of the charged droplets diminished with decreasing flow rate and increasing capillary voltage. In addition to masses and charge numbers, the numbers of the charged droplets and the charged particles were estimated.
| Original language | English |
|---|---|
| Article number | 064901 |
| Journal | Journal of Applied Physics |
| Volume | 111 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 2012 Mar 15 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Physics and Astronomy(all)
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Component analysis of a mixed beam generated by vacuum electrospray of an ionic liquid. / Fujiwara, Yukio; Saito, Naoaki; Nonaka, Hidehiko; Ichimura, Shingo.
In: Journal of Applied Physics, Vol. 111, No. 6, 064901, 15.03.2012.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Component analysis of a mixed beam generated by vacuum electrospray of an ionic liquid
AU - Fujiwara, Yukio
AU - Saito, Naoaki
AU - Nonaka, Hidehiko
AU - Ichimura, Shingo
PY - 2012/3/15
Y1 - 2012/3/15
N2 - Vacuum electrospray of a quaternary ammonium ionic liquid, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium bis(trifluoromethanesulfonyl) amide (DEME-TFSA), was investigated to develop a primary ion source for secondary ion mass spectrometry (SIMS). Since the ionic liquid contains many methyl and ethyl groups as well as protons, its beam is expected to efficiently produce protonated molecules for SIMS analysis of organic materials. Experimental results showed that the beam consisted of charged particles of m/z about 1000 and charged droplets of m/z 10 5. The current components of both the charged particles and droplets changed with the applied voltage and the flow rate of the ionic liquid. With decreasing flow rate, the current component of the charged droplets increased, whereas that of the charged particles decreased. The m/z values of the charged droplets diminished with decreasing flow rate and increasing capillary voltage. In addition to masses and charge numbers, the numbers of the charged droplets and the charged particles were estimated.
AB - Vacuum electrospray of a quaternary ammonium ionic liquid, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium bis(trifluoromethanesulfonyl) amide (DEME-TFSA), was investigated to develop a primary ion source for secondary ion mass spectrometry (SIMS). Since the ionic liquid contains many methyl and ethyl groups as well as protons, its beam is expected to efficiently produce protonated molecules for SIMS analysis of organic materials. Experimental results showed that the beam consisted of charged particles of m/z about 1000 and charged droplets of m/z 10 5. The current components of both the charged particles and droplets changed with the applied voltage and the flow rate of the ionic liquid. With decreasing flow rate, the current component of the charged droplets increased, whereas that of the charged particles decreased. The m/z values of the charged droplets diminished with decreasing flow rate and increasing capillary voltage. In addition to masses and charge numbers, the numbers of the charged droplets and the charged particles were estimated.
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U2 - 10.1063/1.3693558
DO - 10.1063/1.3693558
M3 - Article
VL - 111
JO - Journal of Applied Physics
JF - Journal of Applied Physics
SN - 0021-8979
IS - 6
M1 - 064901
ER -