Compound nanoimprint processes and their applications for devices

Jun Mizuno, Hidetoshi Shinohara

Research output: Contribution to journalArticle

Abstract

In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.

Original languageEnglish
Pages (from-to)343-346
Number of pages4
JournalIEEJ Transactions on Sensors and Micromachines
Volume130
Issue number8
DOIs
Publication statusPublished - 2010

Fingerprint

Nanoimprint lithography
Electrodeposition
Fabrication
Masks
Resins
Throughput
Metals

Keywords

  • Electrodeposition
  • UV-NIL
  • UV-photocurable resin

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Mechanical Engineering

Cite this

Compound nanoimprint processes and their applications for devices. / Mizuno, Jun; Shinohara, Hidetoshi.

In: IEEJ Transactions on Sensors and Micromachines, Vol. 130, No. 8, 2010, p. 343-346.

Research output: Contribution to journalArticle

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