Abstract
In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.
Original language | English |
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Pages (from-to) | 343-346 |
Number of pages | 4 |
Journal | ieej transactions on sensors and micromachines |
Volume | 130 |
Issue number | 8 |
DOIs | |
Publication status | Published - 2010 |
Keywords
- Electrodeposition
- UV-NIL
- UV-photocurable resin
ASJC Scopus subject areas
- Mechanical Engineering
- Electrical and Electronic Engineering