Compound nanoimprint processes and their applications for devices

Jun Mizuno; Hidetoshi Shinohara

doi:10.1541/ieejsmas.130.343

Compound nanoimprint processes and their applications for devices

Jun Mizuno, Hidetoshi Shinohara

Research Organization for Nano & Life Innovation

Research output: Contribution to journal › Article › peer-review

Abstract

In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.

Original language	English
Pages (from-to)	343-346
Number of pages	4
Journal	ieej transactions on sensors and micromachines
Volume	130
Issue number	8
DOIs	https://doi.org/10.1541/ieejsmas.130.343
Publication status	Published - 2010

Keywords

Electrodeposition
UV-NIL
UV-photocurable resin

ASJC Scopus subject areas

Mechanical Engineering
Electrical and Electronic Engineering

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