Compound nanoimprint processes and their applications for devices

Jun Mizuno*, Hidetoshi Shinohara

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.

Original languageEnglish
Pages (from-to)343-346
Number of pages4
Journalieej transactions on sensors and micromachines
Issue number8
Publication statusPublished - 2010


  • Electrodeposition
  • UV-NIL
  • UV-photocurable resin

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering


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