Abstract
In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.
| Original language | English |
|---|---|
| Pages (from-to) | 343-346 |
| Number of pages | 4 |
| Journal | ieej transactions on sensors and micromachines |
| Volume | 130 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - 2010 Sep 28 |
Keywords
- Electrodeposition
- UV-NIL
- UV-photocurable resin
ASJC Scopus subject areas
- Mechanical Engineering
- Electrical and Electronic Engineering
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Cite this
Mizuno, J., & Shinohara, H. (2010). Compound nanoimprint processes and their applications for devices. ieej transactions on sensors and micromachines, 130(8), 343-346. https://doi.org/10.1541/ieejsmas.130.343