Compound nanoimprint processes and their applications for devices

Jun Mizuno; Hidetoshi Shinohara

doi:10.1541/ieejsmas.130.343

Compound nanoimprint processes and their applications for devices

Jun Mizuno, Hidetoshi Shinohara

Research Organization for Nano & Life Innovation

Research output: Contribution to journal › Article › peer-review

Abstract

In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.

Original language	English
Pages (from-to)	343-346
Number of pages	4
Journal	ieej transactions on sensors and micromachines
Volume	130
Issue number	8
DOIs	https://doi.org/10.1541/ieejsmas.130.343
Publication status	Published - 2010

Keywords

Electrodeposition
UV-NIL
UV-photocurable resin

ASJC Scopus subject areas

Mechanical Engineering
Electrical and Electronic Engineering

Access to Document

10.1541/ieejsmas.130.343

Fingerprint Dive into the research topics of 'Compound nanoimprint processes and their applications for devices'. Together they form a unique fingerprint.

Cite this

@article{6238804e2a694cc5a3b6b9a0fb75708e,

title = "Compound nanoimprint processes and their applications for devices",

abstract = "In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.",

keywords = "Electrodeposition, UV-NIL, UV-photocurable resin",

author = "Jun Mizuno and Hidetoshi Shinohara",

year = "2010",

doi = "10.1541/ieejsmas.130.343",

language = "English",

volume = "130",

pages = "343--346",

journal = "IEEJ Transactions on Sensors and Micromachines",

issn = "1341-8939",

publisher = "The Institute of Electrical Engineers of Japan",

number = "8",

}

TY - JOUR

T1 - Compound nanoimprint processes and their applications for devices

AU - Mizuno, Jun

AU - Shinohara, Hidetoshi

PY - 2010

Y1 - 2010

N2 - In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.

AB - In this paper, fabrication methods of metal patterns using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition are demonstrated. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, the simple and high-throughput fabrication process was realized. Several examples of functional device using these methods are described.

KW - Electrodeposition

KW - UV-NIL

KW - UV-photocurable resin

UR - http://www.scopus.com/inward/record.url?scp=77956971696&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77956971696&partnerID=8YFLogxK

U2 - 10.1541/ieejsmas.130.343

DO - 10.1541/ieejsmas.130.343

M3 - Article

AN - SCOPUS:77956971696

VL - 130

SP - 343

EP - 346

JO - IEEJ Transactions on Sensors and Micromachines

JF - IEEJ Transactions on Sensors and Micromachines

SN - 1341-8939

IS - 8

ER -

Compound nanoimprint processes and their applications for devices

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Cite this