Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides

Yuya Kajikawa, Suguru Noda, Hiroshi Komiyama

Research output: Contribution to journalArticle

84 Citations (Scopus)

Abstract

The PO-determining mechanism of reactive-sputter-deposited TiN, AlN, and TaN was studied. Both the existing experimental results for these three materials and the existing models explaining preferred orientation were experimentally studied. The resultant data were analyzed in detail.

Original languageEnglish
Pages (from-to)1943-1954
Number of pages12
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume21
Issue number6
DOIs
Publication statusPublished - 2003 Nov
Externally publishedYes

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Nitrides
nitrides

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides. / Kajikawa, Yuya; Noda, Suguru; Komiyama, Hiroshi.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 21, No. 6, 11.2003, p. 1943-1954.

Research output: Contribution to journalArticle

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