Abstract
A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.
| Original language | English |
|---|---|
| Pages (from-to) | 1373-1375 |
| Number of pages | 3 |
| Journal | Chemistry Letters |
| Volume | 45 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - 2016 Jan 1 |
| Externally published | Yes |
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Keywords
- Lithography
- Nanoimprinting
- UV
ASJC Scopus subject areas
- Chemistry(all)
Cite this
Condition determination of ultraviolet light exposure for high-throughput nanoimprinting. / Ishito, Yota; Yano, Haruna; Hiroshiba, Nobuya; Kubo, Shoichi; Nakagawa, Masaru.
In: Chemistry Letters, Vol. 45, No. 12, 01.01.2016, p. 1373-1375.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Condition determination of ultraviolet light exposure for high-throughput nanoimprinting
AU - Ishito, Yota
AU - Yano, Haruna
AU - Hiroshiba, Nobuya
AU - Kubo, Shoichi
AU - Nakagawa, Masaru
PY - 2016/1/1
Y1 - 2016/1/1
N2 - A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.
AB - A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.
KW - Lithography
KW - Nanoimprinting
KW - UV
UR - http://www.scopus.com/inward/record.url?scp=84996866866&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84996866866&partnerID=8YFLogxK
U2 - 10.1246/cl.160663
DO - 10.1246/cl.160663
M3 - Article
AN - SCOPUS:84996866866
VL - 45
SP - 1373
EP - 1375
JO - Chemistry Letters
JF - Chemistry Letters
SN - 0366-7022
IS - 12
ER -