Abstract
A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.
Original language | English |
---|---|
Pages (from-to) | 1373-1375 |
Number of pages | 3 |
Journal | Chemistry Letters |
Volume | 45 |
Issue number | 12 |
DOIs | |
Publication status | Published - 2016 Jan 1 |
Externally published | Yes |
Keywords
- Lithography
- Nanoimprinting
- UV
ASJC Scopus subject areas
- Chemistry(all)