Abstract
A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.
| Original language | English |
|---|---|
| Pages (from-to) | 1373-1375 |
| Number of pages | 3 |
| Journal | Chemistry Letters |
| Volume | 45 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - 2016 Jan 1 |
| Externally published | Yes |
Keywords
- Lithography
- Nanoimprinting
- UV
ASJC Scopus subject areas
- Chemistry(all)
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Cite this
Ishito, Y., Yano, H., Hiroshiba, N., Kubo, S., & Nakagawa, M. (2016). Condition determination of ultraviolet light exposure for high-throughput nanoimprinting. Chemistry Letters, 45(12), 1373-1375. https://doi.org/10.1246/cl.160663