Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

Yota Ishito, Haruna Yano, Nobuya Hiroshiba, Shoichi Kubo, Masaru Nakagawa

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.

Original languageEnglish
Pages (from-to)1373-1375
Number of pages3
JournalChemistry Letters
Volume45
Issue number12
DOIs
Publication statusPublished - 2016 Jan 1
Externally publishedYes

Fingerprint

Resins
Fluorescence microscopy
Throughput
Photopolymerization
Differential scanning calorimetry
Atomic force microscopy
Adhesion
Defects
Ultraviolet Rays
acrylic acid

Keywords

  • Lithography
  • Nanoimprinting
  • UV

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Condition determination of ultraviolet light exposure for high-throughput nanoimprinting. / Ishito, Yota; Yano, Haruna; Hiroshiba, Nobuya; Kubo, Shoichi; Nakagawa, Masaru.

In: Chemistry Letters, Vol. 45, No. 12, 01.01.2016, p. 1373-1375.

Research output: Contribution to journalArticle

Ishito, Yota ; Yano, Haruna ; Hiroshiba, Nobuya ; Kubo, Shoichi ; Nakagawa, Masaru. / Condition determination of ultraviolet light exposure for high-throughput nanoimprinting. In: Chemistry Letters. 2016 ; Vol. 45, No. 12. pp. 1373-1375.
@article{6f2eb76d03c244618ee3d724afc14428,
title = "Condition determination of ultraviolet light exposure for high-throughput nanoimprinting",
abstract = "A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.",
keywords = "Lithography, Nanoimprinting, UV",
author = "Yota Ishito and Haruna Yano and Nobuya Hiroshiba and Shoichi Kubo and Masaru Nakagawa",
year = "2016",
month = "1",
day = "1",
doi = "10.1246/cl.160663",
language = "English",
volume = "45",
pages = "1373--1375",
journal = "Chemistry Letters",
issn = "0366-7022",
publisher = "Chemical Society of Japan",
number = "12",

}

TY - JOUR

T1 - Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

AU - Ishito, Yota

AU - Yano, Haruna

AU - Hiroshiba, Nobuya

AU - Kubo, Shoichi

AU - Nakagawa, Masaru

PY - 2016/1/1

Y1 - 2016/1/1

N2 - A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.

AB - A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.

KW - Lithography

KW - Nanoimprinting

KW - UV

UR - http://www.scopus.com/inward/record.url?scp=84996866866&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84996866866&partnerID=8YFLogxK

U2 - 10.1246/cl.160663

DO - 10.1246/cl.160663

M3 - Article

VL - 45

SP - 1373

EP - 1375

JO - Chemistry Letters

JF - Chemistry Letters

SN - 0366-7022

IS - 12

ER -