Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

Yota Ishito, Haruna Yano, Nobuya Hiroshiba, Shoichi Kubo, Masaru Nakagawa

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.

Original languageEnglish
Pages (from-to)1373-1375
Number of pages3
JournalChemistry Letters
Volume45
Issue number12
DOIs
Publication statusPublished - 2016 Jan 1
Externally publishedYes

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Keywords

  • Lithography
  • Nanoimprinting
  • UV

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Ishito, Y., Yano, H., Hiroshiba, N., Kubo, S., & Nakagawa, M. (2016). Condition determination of ultraviolet light exposure for high-throughput nanoimprinting. Chemistry Letters, 45(12), 1373-1375. https://doi.org/10.1246/cl.160663