Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

Yota Ishito; Haruna Yano; Nobuya Hiroshiba; Shoichi Kubo; Masaru Nakagawa

doi:10.1246/cl.160663

Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

Yota Ishito, Haruna Yano, Nobuya Hiroshiba, Shoichi Kubo, Masaru Nakagawa^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.

Original language	English
Pages (from-to)	1373-1375
Number of pages	3
Journal	Chemistry Letters
Volume	45
Issue number	12
DOIs	https://doi.org/10.1246/cl.160663
Publication status	Published - 2016 Jan 1
Externally published	Yes

Keywords

Lithography
Nanoimprinting
UV

ASJC Scopus subject areas

Chemistry(all)

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10.1246/cl.160663

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title = "Condition determination of ultraviolet light exposure for high-throughput nanoimprinting",

abstract = "A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.",

keywords = "Lithography, Nanoimprinting, UV",

author = "Yota Ishito and Haruna Yano and Nobuya Hiroshiba and Shoichi Kubo and Masaru Nakagawa",

year = "2016",

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doi = "10.1246/cl.160663",

language = "English",

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T1 - Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

AU - Ishito, Yota

AU - Yano, Haruna

AU - Hiroshiba, Nobuya

AU - Kubo, Shoichi

AU - Nakagawa, Masaru

PY - 2016/1/1

Y1 - 2016/1/1

N2 - A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.

AB - A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.

KW - Lithography

KW - Nanoimprinting

KW - UV

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JO - Chemistry Letters

JF - Chemistry Letters

SN - 0366-7022

IS - 12

ER -

Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

Abstract

Keywords

ASJC Scopus subject areas

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