Cone structure formation by preferred growth of random nuclei in chemical vapor deposited epitaxial silicon films

Suguru Noda, Yuya Kajikawa, Hiroshi Komiyama

Research output: Contribution to journalArticle

6 Citations (Scopus)
Original languageEnglish
Pages (from-to)87-89
Number of pages3
JournalChemical Vapor Deposition
Volume8
Issue number3
DOIs
Publication statusPublished - 2002 May 1

ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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